Used LAM RESEARCH Alliance A4 9400SE #9072558 for sale

Name: LAM RESEARCH Alliance A4 9400SE
Brand: LAM RESEARCH
SKU: 9072558
Availability: InStock

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Photo Used LAM RESEARCH Alliance A4 9400SE For Sale

Etchers / Ashers

Manufacturer

LAM RESEARCH

Model

Alliance A4 9400SE

ID: 9072558

Wafer Size: 8"

Vintage: 1998

Poly etcher, 8" Cassette: plastic, 8" Wafer shape: SNNF SMIF interface: no System Information: Platform: Alliance 4.1 Process chamber qty: 3 Software version: A2.2-018 SECS/GEM: yes Chambers: Position 1 (PM1): TCP9400SE / Poly etch Position 2 (PM2): TCP9400SE / Poly etch Position 3 (PM3): TCP9400SE / Poly etch Position 4 (PM4): none Etch chambers: Turbo pump EDWARDS STP-A1303CV80 Turbo N2 fixed or MFC Type Fixed Helium UPC UPC-8130 Endpoint detector No Pendulum valve model VAT 65046-PH52-ADE Chamber Manometer MKS E29B-23813 Turbo Manometer MKS 625A-23347 Foreline Manometer MKS 625A-11TD Helium Manometer yes Top RF generator model AE / 3155059-026 Bottom RF generator model AE / 3155059-028 (RFG1250 HALO) TCP Match yes Bias Match yes TOP RF Sense Box yes Bias RF Sense Box yes Auto Tune Board yes DIP Board yes VCI Connected No Gas Configuration: Chamber volume used for gas cal: 36200ml Gas Box: Type: - Gas box qty: 3, stacking Manual valve: yes on each line Pressure gauge: yes on each line Regulator: yes on each line Filter: yes on each line Gas Panel Pallet: Gas line qty with N2 purge line 7 lines per chamber Gas line qty without N2 purge line 0 MFC type UFC-1661 / UFC-1660 / FC-2950MEP5 Gas line (gas name, MFC size): PM1 SF6 200 / UFC-1660 Line 1 SO2 100 / UFC-1660 Line 2 Ar 200 / UFC-1660 Line 3 O2 100 / UFC-1660 Line 4 He 200 / FC-2950MEP5 Line 5 CF4 200 / FC-2950MEP5 Line 6 NF3 304 / UFC-1661 Line 7 - Line 8 PM2 Line 1 SF6 200 / UFC-1660 Line 2 SO2 100 / UFC-1660 Line 3 Ar 200 / UFC-1660 Line 4 O2 100 / UFC-1660 Line 5 He 202 / FC-2950MEP5 Line 6 CF4 200 / UFC-1661 Line 7 NF3 405 / UFC-1661 Line 8 - PM3 Line 1 SF6 200 / UFC-1660 Line 2 SO2 100 / UFC-1660 Line 3 Ar 203 / UFC-1660 Line 4 O2 102 / UFC-1660 Line 5 He 200 / UFC-1661 Line 6 CF4 200 / FC-2950MEP5 Line 7 NF3 315 / UFC-1661 Line 8 - Mainframe: Load lock: Dual VCE loader / manual door open Robot type: BROOKS Model 001-7600-10 with dual aluminum blade EMO button: front, side Signal tower: front; G / Y / R System monitor display: (1), front Remotes: (2) RPM EMO button: yes Line frequency and voltage: 208VAC, 3 phase Remote UPS interface: yes UPS: no Heat Exchanger type: For cathode: NOAH PRECISION Model 3300: -20ºC to +90ºC QTY: 3 (not included) Pumps type: Transfer Module EBARA A70W, not included in scope of supply PM1 EBARA A30W, not included in scope of supply PM2 EBARA A30W, not included in scope of supply PM3 EBARA A30W, not included in scope of supply Gas Scrubber: (1) EBARA GTE-3-0WVT, not included in scope of supply Currently in cleanroom 1998 vintage.

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LAM RESEARCH Alliance A4 9400SE is a highly advanced etch and ash equipment that offers enhanced etching and ash performance for many tools and processes. This advanced etcher / asher has both repeatable and consistent results to meet the most demanding demands of customers. The system includes an auto-loader/unloader and a 3-axis robotic arm for loading/unloading wafers, making it ideal for productivity-enhancing automation. The automated unit provides precision control over wafer movement with fast cycle times and precise methodology. The process control software is also configurable to ensure optimized accuracy during processing. As an etcher/ash machine, the A4 9400SE can be used to treat a variety of materials from metals to glass. The tool also features a robust power supply and low-voltage input to ensure consistent and exacting results for both etch and ashing processes. With a high-throughput capacity of up to 120 wafers per hour, the asset is capable of achieving volume and tight process control. The model is also designed with a variety of tool interfaces, so that customers can easily configure the equipment to fit their specific requirements. LAM RESEARCH ALLIANCE A4 9400 SE also offers real-time data monitoring and analysis for validation and issue resolution, enabling users to monitor the complete process on a real-time basis. Through comprehensive protection and analysis of the wafers in the system, users can adjust process parameters to correct and optimize solutions for maximum performance. Besides being an efficient and automated etch and ash unit, Alliance A4 9400SE also offers advanced process control capabilities and maintenance features. The machine includes protection against contaminants and rapid measurement of wafers as well as detailed diagnostics and precision control over the process. In addition, the tool can measure wafer geometry and thickness, allowing for precision and accuracy in the etching and ashing processes. Overall, ALLIANCE A4 9400 SE is a reliable, efficient and precise automated etcher/ asher asset that combines precise control, enhanced performance and automation with real-time monitoring and analysis to enable efficient production and process optimization. Its advanced features make it the ideal model for high-quality, rapid and repeatable etch and ash jobs.