Used LAM RESEARCH Alliance A4 9600 #9204633 for sale
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ID: 9204633
Etcher
(4) Chambers
Alliance (A4) mainframe
(4) 9600 SE Process modules (Used for metal etch process)
VCE Robotic arm extend drives
Auto door option
Bellows style cassette / Platforms
Wafer aligner
LL Slide sensor
Pre-post alignment
Magnatran 7 robot
PM1 Configuration:
Alliance 9600 SE:
Generator (X2): AE-RFG 1250
Turbo pump: SEIKO SEIKI STP1303C
Electrostatic chuck included
Upgraded VAT 65 pendelum throttle valve
NOAH 3500 POU Chiller for ESC temperature control
Endpoint detector
With chan A-703 nm chan B 440 nm
Gases panel configuration:
Unit 1661 model MFC's (X6)
MFC1 SF6 200 sccm
MFC2 O2-Hi 50 sccm
MFC3 Ar 300 sccm
MFC4 O2-Lo 10 sccm
MFC5 NF3 100 sccm
MFC6 N2 100 sccm (Spare)
PM2 Configuration:
Alliance 9600 SE:
Generator (X2): AE-RFG 1250
Turbo pump: SEIKO SEIKI STP1303C
Electrostatic chuck included
Upgraded VAT 65 pendelum throttle valve
NOAH 3500 POU chiller for ESC temperature control
Endpoint detector
With chan A-703 nm, chan B 440 nm
Endpoint monochonometer
Gases panel configuration:
Unit 1661 model MFC's (X6)
MFC1 SF6 200 sccm
MFC2 O2-Hi 50 sccm
MFC3 Ar 300 sccm
MFC4 O2-Lo 10 sccm
MFCS NF3 100 sccm
MFC6 N2 100 sccm (Spare)
PM3 Configuration:
Alliance 9600 SE:
Generator (X2): AE-RFG 1250
Turbo pump: SEIKO SEIKI STP1303C
Electrostatic chuck included
Upgraded VAT 65 pendelum throttle valve
NOAH 3500 POU Chiller for ESC temperature control
Endpoint detector
With chan A-703 nm, chan B 440 nm
Endpoint monochonometer
Gases panel configuration:
Unit 1661 model MFC's (X6)
MFC1 SF6 200 sccm
MFC2 O2-Hi 50 sccm
MFC3 Ar 300 sccm
MFC4 O2-Lo 10 sccm
MFC5 NF3 100 sccm
MFC6 N2 100 sccm (Spare)
PM4 Configuration:
Alliance 9600 SE:
Generator (X2): AE-RFG 1250
Turbo pump: SEIKO SEIKI STP 1303C
Electrostatic chuck included
Upgraded VAT 65 pendelum throttle valve
NOAH 3500 POU Chiller for ESC temperance control
Endpoint detector
With chan A-703 nm chan B 440 nm
Endpoint monochonometer
Gases panel configuration:
Unit 1661 model MFC's (X6)
MFC1 SF6 200 sccm
MFC2 O2-Hi 50 sccm
MFC3 Ar 300 sccm
MFC4 O2-Lo 10 sccm
MFCS NF3 100 sccm
MFC6 N2 100 sccm (Spare)
System peripherals and ancillary components:
Remote AC box (RPM)
Gas boxes per chamber ((4) Stackable)
(4) NOAH POU Chiller model 3500
Cathode cooling and temperature control
Includes:
3500 Controller or equivalent
Auxiliary rack for controllers.
LAM RESEARCH Alliance A4 9600 is an etcher/asher module designed for precision processing of large substrates. It features a transmission-style RF source, a four-zone bottom heating platen, and a large chamber that allows for fast, efficient processing. The A4 9600 is ideal for applications such as the etching of metals, thick film substrates, and dielectric films. For metals, the A4 9600 is capable of delivering Power densities up to 15w/cm2 at RF frequencies between 200kHz and 1MHz, along with an operating temperature range of 200-400°C. It features an auto-startup function which allows for easy operator setup. Additionally, the A4 9600 can be calibrated to achieve tight control of uniformity, repeatability, and other process parameters. For thick film substrates, the A4 9600 can etch at temperatures up to 400°C. Its precision pressure control capabilities allow for fine tuning of the process to achieve fine features. It is also capable of etching thicker structures than available with traditional etch processes. For dielectric films, the A4 9600 excels in controlled, and accurate etching of critical features. Its dual source capability allows for simultaneous etching of different films while its close thermal coupling improves the uniformity of the etch process. Additionally, the RF source can be easily calibrated to match process parameters. Overall, Alliance A4 9600 is an ideal etcher/asher module for precision processing of large substrates. Its transmission-style RF source, four-zone bottom heating platen, and large chamber provide excellent control and uniformity of process parameters. Its wide operating temperature range, precision pressure control capabilities, and close thermal coupling make it a great choice for thick film etching and dielectric film etching.
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