Used LAM RESEARCH Alliance A4 9600SE #9161966 for sale

LAM RESEARCH Alliance A4 9600SE is an etcher/asher, specifically a wet oxide etcher/asher equipment designed for advanced semiconductor manufacturing. The system is a combination of two independent electrochemical processes - etching and ashing, each with its own integrated process control and safety systems. The unit is designed to provide a high degree of precision and uniformity throughout the etching and ashing processes. It also utilizes an advanced performance control to ensure oxidation results are precision-controlled and streak-free. LAM RESEARCH ALLIANCE A4 9600 SE utilizes a chlorine based solution for the etching process. The chlorine is delivered through an electrically powered liquid delivery machine containing high purity chlorine gas and a strongly buffered solution of sodium hydroxide. This chlorine solution is pumped through a specially designed Reaction Chamber to the substrate placed in vacuum using advanced vacuum transfer systems. During the etching process, the chlorine ions react with the semiconductor to form oxide. The oxide buildup is monitored by a combination of in-situ infrared and area detectors. The ashing process utilizes an electric arc discharge along with a special gas mixture. This combination produces a hot plasma stream that turns the oxide layer to a vapor which is then removed from the reactor chamber. During the process, oxide vaporizes from the substrate and can be adjusted by adjusting the electrical power to the arc and gas composition. Alliance A4 9600SE etcher/asher tool is equipped with many safety features, including an integrated safety protocol that monitors and controls temperature, pressure, and current levels. The asset also includes measures to protect personnel, materials, and equipment by controlling environmental conditions such as particulate levels, and pressure, optical energy, and electrical current. ALLIANCE A4 9600 SE has been designed for optimal operation and calibration, providing industry leading performance for advanced semiconductor fabrication processes. The etcher/asher model provides exceptional control, uniformity, and accuracy, helping device manufacturers stay ahead of their competition.