Used LAM RESEARCH Alliance A4 #9138509 for sale

LAM RESEARCH Alliance A4 is an advanced etcher/asher specifically designed for the etch and ash process. The A4 offers high performance with a unique combination of ion, thermal, and optical etching. It features a fast, reliable, and repeatable process with excellent process control and controllable plasma energy. The A4 has a custom designed ion source and generates significantly higher plasma densities compared to traditional etcher/asher designs. The A4 also features a large open process chamber with higher process pressures than other etcher/asher models. This allows for higher throughput and more efficient etch rates. The A4 is equipped with a patented, automated process chamber that uses CDA (Chemical-Dependent-Aberration) technology. This technology helps to reduce edge variation of etched features, minimize etch defects and ensure uniform profiles. The A4 supports up to 8 recipe layers, which can be used to run several etch processes simultaneously. Its precisionLoadTM plasma focus equipment provides more stable and repeatable etch rates with full macro control and diagnostics. The A4 also supports a wide range of process pre-conditions and process endpoint detuning. Moreover, advanced process monitoring enables in-situ process control capabilities. The A4 is suitable for a wide range of applications including MEMS etching, 3D anisotropic etching, advanced interlevel dielectric etching, ceria isotropic etching, semiconductor etching, and more. It also supports a variety of process gases and enables users to create optimized etch recipes. The A4 provides a universal etching platform which is compatible with a wide variety of materials, enabling users to etch a wide range of process layers for a variety of applications. To ensure safe operation, the A4 offers advanced safety features such as locked plasma chamber doors and a low operating RF pressure. The advanced circuitry of the A4 improves system reliability and the on-board fault detection unit quickly identifies and reports potential problems, allowing quick corrective action. The A4 is an efficient, reliable, and highly precise etching machine and is ideal for etch and ash process flow. It offers dramatic improvements in throughput and process repeatability for demanding semiconductor device etch processes.