Used LAM RESEARCH Alliance A6 4520 #293820037 for sale

LAM RESEARCH Alliance A6 4520
ID: 293820037
Etcher.
LAM RESEARCH Alliance A6 4520 Etcher/Asher is an industrial grade etching and ashing equipment designed for semiconductor manufacturers. It is a high-precision, low-cost machine that utilizes a versatile combination of chamber sizes with different geometries. This allows for precise etching and ashing of different substrates. The machine offers excellent controllability and repeatability by combining precise etch/ash parameters with precise gas flow control. Alliance A6 4520 has an advanced digital control system and a dynamic chamber layout that can accommodate up to 6 substrate sizes up to 8 inches in diameter. LAM RESEARCH Alliance A6 4520 is designed with an integrated unit of digital electronics which provide a precise and reliable platform to ensure maximum etch/ash performance. The machine offers heavy-duty, air- and water-cooled capacitors AND thermocouples, as well as a wide range of options for controlling the etch/ash process. For enhanced process control, the machine can be configured with a PID controller to set constant current and temperature. The adjustable pulsewidth from 0.5 to 50 milliseconds allows for precise etch/ash control which is not achievable with other etch/ash systems. Moreover, Alliance A6 4520 provides an integrated solution for gas decomposition and analysis, with a revolutionary vacuum spike detection tool. This asset provides a unique way of monitoring the etch/ash process by detecting gas spikes in the process chamber, enabling faster and more precise control of the etch/ash process. The model is also equipped with an integrated RF generator and adsorber that offers an efficient solution for efficiently cleaning process chamber surfaces. This all-in-one equipment is designed to reduce complexity and process costs while enabling the highest levels of etch/ash quality. LAM RESEARCH Alliance A6 4520 is a reliable and comprehensive system that provides the most precise control over critical etch/ash parameters. It is the ideal etch/ash unit for semiconductor manufacturers and research facilities.
There are no reviews yet