Used LAM RESEARCH Alliance A6 9400 DFM-P #9133861 for sale
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ID: 9133861
Wafer Size: 6"-8"
Vintage: 2000
System, 6"-8"
(2) Blade BROOKS Mag 7 robots
(3) Monitors
Load lock:
Load lock type: Auto door
VCE Elevator: Bellows
Mapping sensor
Cassette type: (25) Slot cassettes
VCE Gate valve
VCE Vacuum isolation valves
TM Vacuum isolation valves
TM Pneumatic valves
TM LID Information:
Pneumatic cylinder lift
Up / Down / Actuate switch
Transport system control
Transport VME:
MVME 147-011, VME335, DIOXVME-240
Multiplexer PCB
Light tower PCB
Chamber information:
Position 1:
Chamber type: No
Position 2:
Chamber type: 9400 DFM-P Poly etch chamber
Chamber process: Poly
Turbo pump with controller: ALCATEL ATH 1600M
VAT Gate valve: VAT65 Pendulum valve
RF Generator bias: ADVANCED ENERGY RFG1250HALO 13.56 MHz
RF Generator TCP: ADVANCED ENERGY RFDS 13.56 MHz
Position 3:
Chamber type: 9400 DFM-P Poly etch chamber
Chamber process: Poly
Turbo pump with controller: ALCATEL ATH 1600M
VAT Gate valve: VAT65 Pendulum valve
RF Generator bias: ADVANCED ENERGY RFG1250HALO 13.56 MHz
RF Generator TCP: ADVANCED ENERGY RFDS 13.56 MHz
Gas box information
PM1 Gas box
PM2 Gas box
MFC Channel gas MFC type
MFC Size
(SCCM)
AC 01 – CHA C4F8 FC-D980CU 50
AC 02 – CHA O2 FC-D780CU 100
AC 03 – CHA CHF3 FC-D780CU 50
AC 04 – CHA CF4 FC-D780CU 200
AC 05 – CHA O2(30%) HE FC-D780CU 100
AC 06 – CHA C4F6 FC-D780CU 50
AC 07 – CHA CH2F2 FC-D780CU 100
AC 08 – CHA CF4 FC-D780CU 1000
AC 09 – CHA H2 FC-D780CU 1500
AC 10 – CHA AR FC-D780CU 1000
AC 11 – CHA N2 FC-D780CU 1000
AC 12 – CHA O2 FC-D780CU 3000
PM3 Gas box
MFC Channel gas MFC type
MFC Size
(SCCM)
AC 01 – CHA C4F8 FC-D780CU 50
AC 02 – CHA O2 FC-D780CU 100
AC 03 – CHA CHF3 FC-D780CU 50
AC 04 – CHA CF4 FC-D980CU 200
AC 05 – CHA O2(30%) HE FC-D780CU 100
AC 06 – CHA C4F6 FC-D780CU 50
AC 07 – CHA CH2F2 FC-D780CU 100
AC 08 – CHA CF4 FC-D780CU 1000
AC 09 – CHA H2 FC-D780CU 1500
AC 10 – CHA AR FC-D780CU 1000
AC 11 – CHA N2 FC-D780CU 1000
AC 12 – CHA O2 FC-D780CU 3000
Wafer present sensors (WPS)
TM & VCE Pump option: Single pump type
Fab clean room configuration: Bulkhead configuration
RPM: 685-495112-100
2000 vintage.
LAM RESEARCH Alliance A6 9400 DFM-P is a post-etch plasma asher capable of completing an etching process for various applications. The asher is a reliable, high-performance option for a wide range of semiconductor manufacturers and features a suite of advanced capabilities. The A6 9400 has two independent, high-frequency RF sources, enabling fast, high-quality etching. It features a moveable automation track with multiple load/unload options, enabling efficient throughput with multiple substrate sizes and etching requirements. The chamber pressure is adjustable, so the pressure range can be accurately customized to the particular material etching requirements. Additionally, the asher has a low-pressure RF pre-cleaning stage, allowing for reduced particle contamination in the post-etch. The A6 9400 also has a low-temperature back-side coolant, ensuring uniform etching and faster processing times. The A6 9400 DFM-P is built on LAM's proven and reliable CXT platform, ensuring advanced capabilities and high-performance. The equipment can process multiple substrate sizes and is capable of batch uniformity over a large area with superior uniformity. It is equipped with intuitive software and hardware control features, including fully automated chamber operations, improved diagnostic capabilities, and safety protections. Additionally, the enhanced particle interactive features allow for better control and longer running times, resulting in increased process and productivity. In addition to its advanced features, the A6 9400 DFM-P is designed for easy maintenance and setup. Its internal parts are easily accessed through the built-in service door, allowing for quick and easy access to the gas lines, valves, and safety interlocks. The system also features a removable door cover for quick setup and cleaning, providing easy access to loader components. The unit includes a standard recipe table, allowing for "scripting" of all the etch parameters and recipes, resulting in improved repeatability. The A6 9400 also offers an optional Oxygen Sensor, ensuring accurate and repeatable process control. Overall, Alliance A6 9400 DFM-P is a powerful, reliable, and efficient post-etch plasma asher. The machine offers advanced features for improved throughput, particle control, and precision etching for a wide range of applications. With its intuitive controls, excellent process repeatability, and easy maintenance, the asher is an ideal tool for any semiconductor production line.
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