Used LAM RESEARCH Alliance A6 9400 DFM #198258 for sale
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ID: 198258
Poly Etcher, 8"
(3) Chamber modules to include:
(1) Model 9400PTX
(2) Model 9400DFM
(3) LAM Enhanced Research Lab Gas Boxes
(1) Control Rack with Noah Precision Models PSC-8000 and PSC-4400 Modules
(2) Edwards Dry Pump Systems
Software: Envision
Platform: Alliance A6
Process: poly
Process modules: DFM
Gas box style: external orbital gas box individual door
Interface: front and rear
Main frame: though the wall bulkhead
Transport module spec:
Robot: Mag 7
End effector: standard stainless steel
Load lock: Brooks automatic
Station 6: Aligner
Process module 1:
Process: poly etch
Process module: DFM
Turbo: Edwards 1600 seiko seiki
Manometer: heated single 10 torr manometer
Vat valve: vat 65 heated
Rf match: standard TCP extended range match
Coil: standard 8" coil
Chuck: E-chuck standard bi-polar
Rf generator: Halo 1250
Endpoint: verity end point
No interferometer
Pump ballast Aov85: yes
Backside He manometers present
Gas lines: non heated
Process module 2
Process: poly etch
Process module: DFM
Turbo: Alcatel 1600m
Manometer: heated single 10 torr manometer
Vat valve: vat 65 heated
Rf match: standard tcp exteneded range match
Coil: standard 8" coil
Chuck: E-chuck standard bi-polar
Rf generator: Halo 1250
Endpoint: verity end point
No interferometer
Pump ballast Aov85: yes
Backside He manometers: present
Gas lines: non heated
Process module 3
Process: poly etch
Process module: DFM
Turbo: Alcatel 1600m
Manometer: heated single 10 torr manometer
Vat valve: vat 65 heated
Rf match: standard tcp exteneded range match
Coil: standard 8" coil
Chuck: E-chuck standard bi-polar
Rf generator: Halo 1250
Endpoint: verity end point
No interferometer
Pump ballast Aov85: yes
Backside He manometers: present
Gas lines: non heated
Pumps
Edwards IQDP 80/500
Chiller Noah solid state
Gas box
Mfc
Unit series with metal seals
Includes:
Gib options
STD Stacking kit
Gas box mounting location: remote
Quick clean kit
TCU hosing: 50ft
TCU configuration: Noah solid state
Operating temperature: 60 - 80c
Tm exhaust: upper
2002 vintage.
LAM RESEARCH Alliance A6 9400 DFM is an industry-leading etcher/asher with advanced features. The machine is designed to come in various configurations and has superior equipment flexibility with the addition of two independent process modules, allowing for precise etching of components and wafers with excellent feature repeatability. Its horizontal deposition tool with excellent uniformity control is an ideal tool for precise etching or ashing of wafers in the semiconductor devices production. LAM RESEARCH ALLIANCE A6 9400DFM etcher/asher is capable of high-speed wafer etching and ashing in one process. It is capable of controlling the etching process with a set-point monitoring rate (SPM) that is precise to within 0.05 µm/s for the best possible repeatability. Additionally, the machine includes state-of-the-art software and quality control features that allow for real-time monitoring of the etching process and ensuring maximum uniformity. Alliance A6 9400 DFM is designed with high-efficiency deposition tools and advanced e-beam and ICP source systems with powerful filtration capabilities, allowing it to be extremely efficient and provide high-quality results. Advanced hardware capabilities such as real-time data capture and logging of process parameters improve repeatability. The layer control system offers uniformity control and real-time diagnostics capabilities that make it a great choice for various high-end etching processes. ALLIANCE A6 9400DFM etcher/asher also offers a variety of process modules and options that allow it to be tailored to suit various applications. Its advanced gate and chamber protection unit promises maximum protection and life-time reliability due to the advanced leakage detector and the wafer protection module. Additionally, the machine also features integrated machine diagnostics to ensure effective and efficient maintenance. Overall, LAM RESEARCH Alliance A6 9400 DFM is an advanced, reliable, and flexible etcher/asher that provides superior tool control, repeatability, and accuracy. Its high-power e-beam and ICP source systems give it excellent filtration and process control capabilities, making it a great choice for various semiconductor device production applications. Its advanced asset diagnostics and leak detection model guarantee maximum protection and a long lifespan. Therefore, LAM RESEARCH ALLIANCE A6 9400DFM is an excellent choice for controlling and repeatable etching, ashing, and various other device manufacturing processes.
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