Used LAM RESEARCH Alliance A6 9400 #9038352 for sale
It looks like this item has already been sold. Check similar products below or contact us and our experienced team will find it for you.
Tap to zoom
![LAM RESEARCH Alliance A6 9400 Photo Used LAM RESEARCH Alliance A6 9400 For Sale](https://cdn.caeonline.com/images/lam_alliance-a6-9400_397563.png)
![Loading](/img/loader.gif)
Sold
ID: 9038352
Etcher, 8"
Alliance A6 platform
(3) 9400PTX chambers
Bulkhead configuration
CE mark
Pre-aligner
MKS transducer
Magnatran 7 robot
Signal Tower
Remote Operator Interface
EP filter box; 405 + 520nm
ESC
VAT isolation valve
12" TCP coil
Dual end effector
SEIKO SEIKI-STP-A2203C
AERA FC D980C MFCs
Stacked gas boxes
12 gas lines per box
TopRF generator: RFDS
Bottom RF Generator: RFG1250HOLA
(3) TCS DEX-30AGRF chiller
Generator, Turbo Pump Controller, Main Controller
Alliance transport module maintenance manual
Alliance transport module ship with integration Drawings and schematics revision B
Alliance integration gas box drawings and schematics
Alliance SECS/GEM interface revision F
Vacuum pumps and exhaust scrubber not included.
LAM RESEARCH Alliance A6 9400 is an etcher / asher, a type of sputter deposition equipment. The system uses capacitively coupled radio frequency (RF) power to sputter thin layers of metal onto a substrate. Alliance A6 9400 is a high-throughput unit capable of producing uniform film coatings at high rates. The machine is a two-chamber configuration, with an RF power supply, an inert plasma, and a vacuum chamber. The etcher chamber houses the RF electrodes, which are connected to the RF power supply. The RF power in the chamber is controlled by the power supply and adjusted to the desired etching parameters as per the desired etching process. The inert plasma is activated in the chamber and is used to activate the metal ions in the reactive gases. The materials are sputtered onto the substrate as a result of ion bombardment, and the RF power is adjusted to promote uniform deposition of the sputtered metal film. The vacuum chamber provides an environment for the deposition process at low pressure, and the two chambers are linked to maintain a pressure differential between the etching and the vacuum chamber. LAM RESEARCH Alliance A6 9400 is equipped with an advanced multi-sensor imaging tool to monitor the growth of the film during the etching process. The images taken can be used for process monitoring and troubleshooting, as well as providing a visual display of the uniformity of the coating. The asset is also equipped with an open loop process control to provide feedback of the etch rate and uniformity of the coating. Alliance A6 9400 is an adaptable, high-throughput etching / asher capable of producing films with superb performance. Its advanced two-chamber design, open-loop process control, and imaging model provide the user with the ability to precisely control the deposition process and yield desired results.
There are no reviews yet