Used LAM RESEARCH Alliance A6 9400 #9296416 for sale

LAM RESEARCH Alliance A6 9400 is an advanced etcher/asher designed to handle a wide range of tasks for semiconductor device fabrication. It utilizes patented technologies to offer superior process control, increased throughput, and improved yields for etching and ashing processes. The A6 9400 series is capable of supporting the full range of etch/ash process requirements with up to 100 cm2 wafer capacity. The A6 9400 is a large-size, robust etcher/asher with multiple automated features to ensure precision and uniformity of process. It uses Dry Operated Gas Delivery (DOGD) technology to control the gas flow precisely with digital control valves. This provides a clean and stable gas environment for etch processes. It also includes an integrated non-contact thermocouple for precise temperature control. It also uses a fast-flushing equipment to reduce sample processing time. The A6 9400 features a high-speed system configuration to increase throughput and reduce etching time. This includes a high-resolution, 300-watt RF generator for enhanced masking and etching, a high-precision, fast, laser tuning unit for improved homogeneity of the plasma field, and high-speed scan technology to optimize beam shaping. The machine also includes advanced computer control and recipe storage capabilities for repeatability and data traceability. The A6 9400 is designed to be easy to configure and operate, with an intuitive operating tool and touch-screen control panel. The asset can be easily configured to meet specific etch/ash requirements, with customizable parameters and settings. It includes comprehensive safety features including pass-through airlock protection, real-time metrology with an adjustable exposure limit, and an atmospheric monitoring model. Alliance A6 9400 is a reliable and advanced etcher/asher, designed to provide superior process control, increased throughput and yield, and easy operation. It utilizes patented technologies and customizable features to support a wide range of etch/ash requirements for efficient and effective semiconductor device fabrication.