Used LAM RESEARCH Alliance A6 9600 #9276388 for sale

LAM RESEARCH Alliance A6 9600 is a high-precision etch and ash equipment for advanced semiconductor device fabrication. The system offers precise, repeatable, and reliable etching and scavenging operations for a variety of substrates, including silicon wafers, metals, and dielectrics. It is designed for use in dielectric etching applications requiring high etch rates and precise accuracy. The unit is equipped with advanced technological features and intuitive user-friendly control options to provide superior product performance and flexibility. Alliance A6 9600 features an in-line tetrafluoromethane (CF4) etch chamber with precise mass flow control, providing highly repeatable etch profiles at up to 250 mm/s etch rate and a high-resolution 2.5 mm x 2.5 mm patch size. An optimized digital charge-neutralization machine ensures excellent oxidation compliance, reducing oxidation drift and maintaining within ±2V range. The etch tool also features an 8-point annular gaussian electron beam source with automated profile control and a high-resolution pattern generator capable of producing up to 0.02 μm line-widths, making it suitable for high-volume production of small device features. The asset includes an integrated ash model with a 6" dual zone vacuum Ash Chamber offering up to 2800°C temperature control and an 8-gas mix supply equipment for rapid wafer throughput and substrate compatibility. Additionally, the system offers an integrated hydrogen control unit (HCS) to improve endpoint accuracy, optimize photoresist selectivity, and eliminate alkali ash contamination. LAM RESEARCH Alliance A6 9600 supplies the full range of features and capabilities necessary for high-end semiconductor device manufacturing. The machine is optimized for process compatibility, productivity, uniformity control, and throughput, allowing fast, precise, and repeatable etch results from wafer to wafer and lot to lot.