Used LAM RESEARCH Alliance A6 #9389920 for sale

LAM RESEARCH Alliance A6 is a single-wafer batch etcher/asher designed for high-throughput processing. It offers advanced technology with a compact footprint, high performance, and superior processing repeatability. Alliance A6 features a dual-stage RF plasma source with independent DC bias control that provides excellent etching/ashing selectivity, as well as high-rate, high-anisotropy etch/ash processes. It can also be configured for high-density plasma etch or dry stripping etch. The chamber includes an automated, center-oriented gas distribution equipment for improved etch uniformity. The center-oriented gas distribution capability provides ∼10x improvement in etch uniformity, over the traditional co-linear slit systems. The compact yet powerful wafer-level loading/unloading system permits easy sample loading/unloading and placement. The LAM LAM RESEARCH Alliance A6 is capable of handling standard, fragile, and thick-film wafers up to 6" (150 mm). The unit is designed to accommodate higher-temperature processes (up to 450°C) and high-pressure process recipes (up to 65 Torr). The machine's control hardware and software features an intuitive and user-friendly interface. It is capable of storing hundreds of recipes that can be easily recalled. The level of sophistication and intuitive features it offers, eliminates the need for complex programming. Alliance A6 offers many advanced features that ensure user productivity, repeatability, and superior process performance. These features include: advanced diagnostics and monitoring, hydrogen dilution control, uniform gas injection, and substrate RF biasing. LAM RESEARCH Alliance A6 is an ideal etch/ash tool for the deposition of high-performance thin-film materials, including those for semiconductor, optical, and optoelectronic devices. Its superior feature set makes it an excellent choice for enhancing productivity and throughput, while ensuring excellent process control and repeatability.