Used LAM RESEARCH Alliance #9024992 for sale

LAM RESEARCH Alliance is an advanced etching and ashing tool that provides high-end accuracy for precision etch and ashing solutions. It is designed to help create smaller, more precise and repeatable patterns in the etching and ashing of microchips and other electronics components. Alliance is ideal for complex, structurally demanding etching and ashing applications, as the equipment is capable of producing small features with low profile dimension errors and high repeatability accuracy of +/-3 angstroms. The system is composed of several high-end components that ensure precision etching and ashing of the desired substrate material. This includes a high-sensitivity optics setup, which is designed to provide accurate results with very high resolution imaging capabilities, and a high-precision pattern generator and imaging subsystem, which allows the manipulation and control of individual etching and ashing patterns. For the etching process, LAM RESEARCH Alliance comes with a powerful ion source that is capable of customizing etching compositions and achieving controlled etch rates. This powerful ion source consists of a high-energy unit delivering ions through a dynamically-adjustable ion energy range, which allows for etching with a wide range of materials. There is also a custom etching chamber, capable of producing electrical, chemical and thermal fields for the deposition of films and the etching of substrates. This chamber includes a number of accessories to manage different etching parameters and achieve repeatable layers with high reliability. For the ashing process, the unit is equipped with a robust control machine capable of controlling rates for multiple recipes, and offers automated device programming for a faster and more reliable process. Alliance also features a temperate feedback loop tool, which maintains process temperature within tight tolerances during the ashing process. The asset also provides a software interface that supports U.S. Gcode and VLSI CAD, and allows for intuitive layout and parameter simulation and optimization to ensure the highest levels of accuracy in the etching and ashing process. LAM RESEARCH Alliance is designed to meet demanding industry requirements for precision etching and ashing applications with accuracy, repeatability, and reliability. This model is used in microelectronics, semiconductor, medical device, and automotive industries, and is an ideal choice for precision etching and ashing applications.