Used LAM RESEARCH Alliance6 9400 DFM #9250676 for sale

LAM RESEARCH Alliance6 9400 DFM is an etcher / asher designed to support a range of advanced semiconductor processes. It combines high-end proprietary process control software with a unique modular design to provide superior performance and precision. Alliance6 9400 DFM offers a variety of etch and deposition chemistry capabilities. The equipment is compatible with CVD, PECVD, and ALD technologies, as well as resist and etch chemistries. It is capable of processing substrates up to 4" and can reach temperatures up to 950°C. The system delivers excellent uniformity, repeatability, and fast cycle times using the proprietary Multi-Plane Linear FlowTec™ exchange platform, which provides high accuracy and repeatability. The unit also features a versatile plasma source/pump combination that enables uniform plasma etching of both metals and high-k materials in accordance with the user's process recipes. LAM RESEARCH Alliance6 9400 DFM is equipped with an advanced PIC Corporation power supply and allows users to select from a large variety of gases, enabling advanced reactor configurations for film deposition and etching processes. The machine's proprietary software helps reduce variability in the fabrication of submicron features, ensuring superior device performance. The software allows users to monitor, analyze, and optimize process performance to accurately control uniformity, throughput and yield. Alliance6 9400 DFM is ideal for a range of production requirements and compliance with environmental regulations. Its chemical management tool ensures safety and waste reduction, as well as compliance with SEMI S2 requirements. The asset is also designed to match high-throughput, low-cost requirements. Overall, LAM RESEARCH Alliance6 9400 DFM is a highly advanced etcher / asher designed to offer superior performance and precision. Its unique modular design and proprietary software allow users to optimize the process, while its chemical management model ensures security and compliance with environmental regulations.