Used LAM RESEARCH Alliance6 9400 PTX #9250675 for sale

LAM RESEARCH Alliance6 9400 PTX
ID: 9250675
Wafer Size: 8"
Poly etcher, 8" (3) Chambers.
LAM RESEARCH Alliance6 9400 PTX is an etcher / asher that offers process solutions for applications that range from full wafer etch / ashing processes to back-end processes such as photoresist stripping and metals removal. Alliance6 9400 PTX is a versatile and advanced etcher/aser that features a single process chamber and provide high- throughput, low-cost, flexibility in process design and a wide range of process capabilities. LAM RESEARCH Alliance6 9400 PTX utilizes a parallel electrode-powered inductively coupled plasma (ICP) source. It is designed to provide efficient plasma control and provide higher reliability and repeatability of processes. It provides uniform and clean etch/ash processes with precise endpoint detection. The etcher/asher consists of a single process chamber and an easy-to-use touch-screen controller. It is designed to provide better process control and improved down times, as well as enhanced repeatability and uniformity. Alliance6 9400 PTX is a reliable and stable etcher / asher which meets the stringent global safety and environmental requirements, making it safe for use in production systems. It is equipped with a patented dual-frequency RF process-monitoring system and an extremely advanced wafer handling system to enable multi-wafer processing. It includes multiple process parameters including substrate temperature, process gas composition, pressure, power and current. All these parameters can be precisely adjusted to obtain optimal results for an extensive range of etch / ashing processes. The etcher/asher utilizes the most advanced software package, allowing for ease of operation and optimization of process parameters. Overall, LAM RESEARCH Alliance6 9400 PTX is a versatile, advanced and reliable etcher / asher that is designed for high-throughput and low-cost processes. It offers precise process control and improved down times as well as enhanced repeatability and uniformity. In addition, it meets stringent global safety and environmental requirements making it safe for production systems.
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