Used LAM RESEARCH Autoetch 490 #293697198 for sale

LAM RESEARCH Autoetch 490 is an etcher / asher designed to quickly and precisely etch microelectronic materials, up to 12-inch wafers. It is ideal for a variety of etching operations used to manufacture integrated circuits, including: high aspect etching, hard mask etching, feature sizes down to 0.25 microns, shallow etching, and deep etching. Autoetch 490 features a high-vacuum etching chamber, a buffered gas delivery equipment, and a precise robotic substrate positioning system. The unit offers precision etching control with millisecond response to enable high throughput for small features and ultra-shallow structures. LAM RESEARCH Autoetch 490 employs a high-precision robotic positioning machine to precisely match etch rate across large wafers. Its vacuum tool is capable of reaching high processing pressures in the milliTorr range. Autoetch 490 incorporates power linkages to provide highly precise operation with a 300nm shot size. It is equipped with an ion bombardment asset to maximize etch rate by crosslinking polymers and ensuring uniformity of etch depth across the substrate surface. It also features a gas optimization model to enable etching instructions, such as high aspect ratios, without damaging the substrate surface. The equipment is also highly sensitive to etch rate changes and is equipped with in situ particle detection technology to monitor in situ ions, gases, and particles. LAM RESEARCH Autoetch 490 offers a variety of process modules that can be incorporated into its system for improved control, such as a temperature chamber for etch profile tuning and an argument chamber for rapid tuning of etch rates. It is also equipped with a patented charge-neutralization unit to effectively control etching parameters, improving performance in etching applications requiring high aspect ratios. Autoetch 490 is an ideal tool for microelectronic and semiconductor processing, including shallow etching and deep etching of metal and metal-oxide layers. The machine meets both industrial and research needs, providing accurate and repeatable etching results with a short cycle time. It is a reliable, robust, and cost-effective etching solution designed to minimize total costs.