Used LAM RESEARCH Autoetch 490 #293811780 for sale

LAM RESEARCH Autoetch 490 is an etcher / asher designed for high-throughput processing of high-margin substrates. This etcher / asher is highly engineered for optimized performance and high productivity. Autoetch 490 features a high-pressure, high-capacity process chamber and a wide-range of etch chemistry solutions. The chamber is designed to maximize gas utilization, while the uniform etching results and superior process accuracy are enabled by the advanced process control algorithms. Designed for high-yield and low-cost operation, LAM RESEARCH Autoetch 490 can process multiple wafers at the same time with consistent etch critical feature size requirements and process time. Autoetch 490 also features a variety of process options, such as active platen temperature control, multiple-gas inlet, and an active cooling system. With robust process control capabilities, LAM RESEARCH Autoetch 490 can modify parameters in real-time to maximize etching yield and profile accuracy. Autoetch 490 is well-suited for plasma etching, wet etching, ashing, gate oxide etching and sidewall profile etching. It has a high yield rate of 50-100%, and can be coupled with both RF and Open Tower architectures. LAM RESEARCH Autoetch 490 is standard with a 32-bit Windows-based software platform, allowing it to be easily integrated into existing production environments. Autoetch 490 also has safety features which minimize contamination, as well as advanced software solutions for defect inspection and process control. The system is easy to operate, with a full color LCD display for monitoring status and operations. The remote access capability provides users with remote diagnostics to make sure the system is running optimally. Overall, LAM RESEARCH Autoetch 490 is a versatile, high-throughput etcher / asher that can be used to accurately etch high-margin substrates. Featuring robust process control capabilities, advanced safety features and easy operation, this etcher / asher is an ideal solution for a range of etching applications.