Used LAM RESEARCH Autoetch 490 #9265329 for sale

LAM RESEARCH Autoetch 490 is an etcher / asher equipment designed for plasma etching, ashing, and dry-stripping applications. The system utilizes advanced plasma etching technologies, in addition to advanced power delivery, for maximum process performance. Autoetch 490 delivers high throughput, high selectivity, and repeatable process performance. The unit is designed and built using proprietary control machine hardware and software, ensuring reliability and robustness. The tool includes a Planar Reactive Ion Etcher (RIE) and a Linear Reactive Ion Etcher (LRIE). The RIE can be used for both through-hole etching, as well as reactive ions etching (RIE). The RIE has a rotating arm which moves between the wafer and the etching/post-etch surface. This ensures uniformity and repeatability of etching. The LRIE is for dry-stripping, ashing and cleaning of samples. The LRIE is equipped with a vacuum chuck which provides automatically-driven and repeatable motion. Thanks to its single-sided cleaning chamber concept, the LRIE is typically used for ashing of large numbers of samples simultaneously. LAM RESEARCH Autoetch 490 also features a wide range of advanced power delivery mechanisms, enabling shaping of the power waveform to the process and the substrate. This allows control of the plasma during etching and ashing, reducing the etching and ashing times to the minimum. The asset also features a variety of other features such as automatic process repeatability, high temperature etching, and auto-track wafer temperature. Autoetch 490 is a reliable, robust and efficient etcher / asher model, ideal for laboratories looking for superior process performance, repeatability and high throughput. The equipment is highly configurable and can be easily set up and adjusted to meet lab-specific requirements, providing an unmatched etching and ashing performance.