Used LAM RESEARCH Autoetch 490B #9245067 for sale
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ID: 9245067
Automatic Plasma Etcher
Includes:
ENI OEM-6M-01 / OEM-6 XL RF Generator
M&W SYSTEMS RPCX17A-D-DI2x10-LI-CMII-HE Flowrite recirculating cooling chiller system
LAM RESEARCH 853-006117-001 Assy RF Match bulkhead
LAM RESEARCH 853-001142-001 Automatch controller
LAM RESEARCH 853-006233-001 Assy
LAM RESEARCH 853-001983-005 End point detector assy
TYLAN General AC-2 AdapTorr vacuum controller
NOR-CAL PRODUCTS 796-008091-001 Pneumatic valve
TYLAN General MDVX-015S08 Vacuum throttle valve
TYLAN General CMLB-11S01 Pressure transducer, 10 Torr
UNIT INSTRUMENTS UFC-1000 Mass flow controller, MFC, CF4, 100 SCCM
UNIT INSTRUMENTS UFC-1200 Mass flow controller, MFC, CHF3, 50 SCCM
UNIT INSTRUMENTS UFC-1200A Mass flow controller, MFC, CL2, 200 SCCM
UNIT INSTRUMENTS UFC-1200A Mass flow controller, MFC, He, 200 SCCM
UNIT INSTRUMENTS UFC-1200A Mass flow controller, MFC, SF6, 200 SCCM.
LAM RESEARCH Autoetch 490B is an advanced etcher/asher equipment designed for a wide range of etching and ashing processes. It is equipped with a unique array of features to ensure optimal results each time. The system consists of a mainframe, an integrated buffer gas unit, an Advanced Process Control (APC) unit, a high-resolution optical machine, and a vertical chamber. The mainframe is designed for efficient operation with a variety of gas systems that provide optimal conditions for etching and ashing processes. It is equipped with an advanced temperature conditioner for precise thermal control and a high-pressure pump for high-performance operation. The integrated buffer gas unit ensures accurate mixing of etching and ashing gases, resulting in uniform etching and ashing. The Advanced Process Control (APC) tool supplies a host of features to ensure optimal process control. This includes end-point detection, automated substrate presentation, adjustable recipe parameters, and automated substrate loading. In addition, APC enables real-time monitoring of process conditions and automatic adjustments with data logging. Autoetch 490B asset also features a high-resolution optical model for precise patterning. The equipment is equipped with a top-of-the-line illumination source for optimal visibility, featuring a bright light source with high-resolution optics for clear imaging. It also has a built-in wide field of view for extended patterning capabilities. Finally, LAM RESEARCH Autoetch 490B is designed with a vertical chamber for stable operation. The chamber is designed for maximum efficiency, with a uniform distribution system to ensure uniform heating and cooling. Additionally, the chamber has an adjustable temperature control unit to maintain process conditions to within tight parameters. Overall, Autoetch 490B is an advanced etching and ashing machine featuring a unique array of features to ensure optimal results each time. With its high-resolution optics, integrated buffer gas unit, adjustable recipe parameters, automated substrate loading and end-point detection, LAM RESEARCH Autoetch 490B is a reliable tool for high-performance etching and ashing processes.
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