Used LAM RESEARCH Autoetch 590 #293761050 for sale

LAM Autoetch 590 etcher / asher is an advanced, high performance etching and vapor deposition system perfect for microelectronic and other related substrates. It offers precise, controllable processes for rapid, high-speed deposition of metals, polymers, oxides, and other materials onto various substrates. Autoetch 590 offers a wide range of process options, including a wide range of SF6 and O2 based plasma etching processes with combination conditions to optimize process performance. It also offers a number of advanced temperature controlled evaporants, such as, GaAs, Silicon, Gold, Silver and more. The combination of these two tools provides an ideal solution to achieve precise material deposition and etching, while managing the most challenging features of substrate processing. LAM Autoetch 590 is constructed using robust materials to provide maximum durability. The process chamber is made of 304 stainless steel, designed for consistent temperature and pressure stability during processing. Its powder-coated steel exterior provides maximum protection from external elements. Autoetch 590 is also equipped with automatic substrate loading, independent airflow control, non-contact presence sensing, RF-generated plasma sources, and a multiple time and temperature recipes for each reactor. This makes it simple for operators to manage the etching and deposition processes with minimum hassle. LAM Autoetch 590 also provides specific solutions for microelectronic and other related applications by utilizing an advanced adaptor system. This enables increased flexibility in creating specialized solutions for various substrate materials, shapes and features. Finally, Autoetch 590 utilizes a highly sensitive diagnostics package, which monitor all aspects of etch and deposition processes. This helps ensure top-quality results, while preventing accidental damages to delicate substrates. All in all, LAM Autoetch 590 is ideal for achieving high performance deposits and etching processes on microelectronic, and other related substrates. Its advanced features make it a valuable asset for various applications, allowing users to achieve reliable results and reduce process downtime.