Used LAM RESEARCH Autoetch 590 #293807554 for sale

LAM RESEARCH Autoetch 590 is a highly sophisticated etcher/asher designed for the modern semiconductor manufacturing workflow. This equipment uses advanced technology to offer precision etching and ashing processes in one convenient machine. By providing the highest level of etching and ashing speed and accuracy available, Autoetch 590 increases production throughput and yields for today's high-volume semiconductor fabrication needs. LAM RESEARCH Autoetch 590 is designed to work in an environmentally friendly manner, using FOUP Containers to safely transport wafers without direct human contact. This eliminates the need for direct handling of hazardous chemicals, protecting both personnel and vital product from damage. The user can also specify a flexible program to specifically tailor job requirements to specific etched wafers for optimal performance. The system is easily configurable to add process capabilities specific to a customer's demands. Autoetch 590 uses a high-resolution, 1µm step collimated laser with optional conversion lenses to enable multiple recipes to be processed. By controlling the laser power and pulse time, users can precisely etch large and small features in wafers, creating difficult patterns at an astonishing speed. The laser also offers the advantage of crosstalk free etching to minimize mask dependent patterning errors. In addition, LAM RESEARCH Autoetch 590 features a wide range of advanced and customizable process parameters such as substrate misalignment control, temperature control, power level settings, slit widths, and aerosolized chemical concentration settings. This allows the user to set precisely the parameters needed for the most difficult jobs. The unit also features advanced metrology and inspection capabilities to ensure etching accuracy at any step in the process. Autoetch 590 uses K-series chemical delivery nozzles to precisely and rapidly control etch rates. This machine has superior control and reliability to ensure highest accuracy and consistency of the etch rate for each substrate processed. The tool incorporates a calibration cell for monitoring etching process-parameters to ensure precision control and extremely uniform etches. The asset is connected to a processing station that can provide a secure environment to control all aspects of etching and ashing. This enables automatic wafer mapping to ensure optimal alignment of wafers with respect to etching and ashing operations. In addition, the model offers high integration to facilitate easy communication with a variety of external processing platforms. LAM RESEARCH Autoetch 590 offers simple to use design tools, setup times, and programming languages to configure the equipment for the most complex production needs. In conclusion, Autoetch 590 is the ideal tool for the modern semiconductor fabrication company. Its advanced technology and integrated features allow for high levels of etching and ashing accuracy, speed, and repeatability. The system provides customer specific processes for extremely rigid production requirements while maintaining a secure and environmentally friendly workflow.