Used LAM RESEARCH Chamber for Kiyo 45 #293609001 for sale

LAM RESEARCH Chamber for Kiyo 45 is an etcher/asher designed for semiconductor wafer processing. It is capable of securely loading up to 200 wafers at a time and is equipped with a patented gas control equipment for improved efficiency and accuracy. This system provides a uniform and consistent process environment across all of the processing modules so that the quality of product is consistent and reliable. The chamber also offers quick turnaround, with wafer processing times as low as 4 minutes for some wafers. The Kiyo 45's chamber design helps to protect the inside environment and reduce contamination. An independent air filtration unit is included to ensure a clean atmosphere and keep particles to a minimum. The chamber also features a number of safety elements, such as a gas leak detection machine, a fire detection tool, and an emergency shut-off valve. The Kiyo 45 has both a manual and an automatic mode of operation. In manual mode, users can access the functions of the chamber, such as temperature and pressure settings, and process parameters, directly via the user interface on the display screen. In automatic mode, the chamber is programmed to and monitored by the on-board automation asset for improved process control and efficiency. The Kiyo 45 is equipped with a dry-transistor plasma generator and an advanced gas beam delivery model. This allows for accurate and fast etching in a low pressure and low temperature environment. The gas beam delivery equipment finely controls and automates the gas mixture and flow rates, providing higher resolution and repeatability. The Kiyo 45's advanced temperature control system is designed to ensure optimal performance of the wet process, resulting in enhanced film quality. The chamber is also capable of storing all data associated with each wafer and process, allowing users to track wafer history and make statistical and diagnostic evaluations. The Kiyo 45 is extremely versatile, capable of tackling all sorts of applications, such as chemical mechanical planarization (CMP), chemical vapor deposition (CVD), and etching and ashing. As such, it is an essential device for the semiconductor industry. It is reliable, highly efficient, and offers excellent quality and process repeatability.