Used LAM RESEARCH / DRYTEK 384T #9384902 for sale

ID: 9384902
Wafer Size: 6"
Vintage: 1995
Triode plasma etch systems, 6", part system Chamber 1995 vintage.
LAM RESEARCH / DRYTEK 384T Etcher/Asher is a high-performance, high-production equipment that is used in the semiconductor industry for etching and ashing hard materials such as metal and silicon. This system is designed for reliable, repeatable processes which are necessary for the production of optimal device performance. DRYTEK 384T is a single-wafer etching unit that uses a combination of a high-flux thermal and plasma etching process to achieve desired device characteristics. The machine can deliver etch and ashing rates up to five times faster than other systems, enabling increased throughput and improved cost efficiency. The chamber is designed for efficient heat dissipation and uses a combination of thermal insulation, heat load management and process sealing technologies. The tool also offers a number of process customization options, including the ability to etch a wide range of materials in different geometries, making it suitable for a wide range of semiconductor applications. LAM RESEARCH 384T asset is also equipped with a number of safety features, such as an ozone scrubber, an oxygen scrubber and a nitrogen scrubber, as well as an in-situ gas monitor, to ensure optimal safety and environmental performance. The model also offers a variety of advanced control features, such as an advanced pressure control equipment, an in-situ time and temperature log, an automatic shut-off system, an auto-start capability, a flow control unit and a recipe-based control machine. This combination of advanced features enables enhanced process control and optimization, making the tool suitable for a variety of production requirements. Additionally, 384T is extremely energy-efficient, utilizing up to 25% less energy than other comparable systems, greatly reducing operational costs and environmental impact. Overall, LAM RESEARCH / DRYTEK 384T Etcher/Asher is a robust, high-performance solution for the production of semiconductor devices, offering enhanced throughput, customized process control and energy efficiency.
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