Used LAM RESEARCH / DRYTEK DRIE-100 #82998 for sale

LAM RESEARCH / DRYTEK DRIE-100
ID: 82998
etch system.
LAM RESEARCH / DRYTEK DRIE-100 is a highly-precise etcher / asher developed to meet the demands of modern semiconductor device processing. DRYTEK DRIE-100 is built for precision and reliability, making it an ideal choice for a large range of device needs. It is capable of cutting through an array of materials, from metals and polymers to dielectrics. LAM RESEARCH DRIE-100 features a number of features that make it a go-to choice for many device manufacturers and research laboratories. The equipment is designed with multiple process zones, allowing for consistent temperature and uniform depth of etch. The design also features a variety of wafer holders and a programmable process control, making it possible to precisely control all process parameters. DRIE-100 is also compatible with a variety of etching gases, as well as a frequency-tuned RF radio-frequency source, making it possible to limit damage to sensitive material. The precision of the system is further enhanced by an inductive plate that maintains uniform electrical potential within the etching chamber. In terms of safety and quality assurance, LAM RESEARCH / DRYTEK DRIE-100 is equipped with all the necessary systems. An integrated vacuum unit ensures that dust, debris, and liquid contaminants are kept away from the machine, preventing the risk of contamination. High-speed camera and optical sensors provide real-time feedback during etching, allowing process parameters to be adjusted in real-time and end-end results to be easily evaluated. DRYTEK DRIE-100 has been thoroughly tested in a number of facilities, certifying its quality and effectiveness. Its precision, uniformity and reliability make it an excellent choice for many device processing needs. It is easy to use and maintain, and its sophisticated design makes the creation of high-quality micro and nano devices both quick and efficient. With its wide selection of features, LAM RESEARCH DRIE-100 is an ideal choice for both research and industrial settings.
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