Used LAM RESEARCH / DRYTEK MS-6 #144520 for sale
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ID: 144520
Wafer Size: 4"
Vintage: 1985
Plasma etcher, 4"
Metal chamber
(3) Chamber holds: 100 mm Metal cassettes to remove oxide on silicon
Power: 208 V, 3 phase, 30 A / line
RF Power: 13.56 MHz
1985 vintage.
LAM RESEARCH / DRYTEK MS-6 is an etcher/asher system used for processes such as etching and cleaning of semiconductor substrates. It is a fully integrated system that includes two separate chambers for etching and cleaning, allowing the operator to conduct both processes in the same run. The etching process uses an electron cyclotron resonance (ECR) microwave plasma to generate a high-density plasma of reactive species, which can etch a wide range of substrates. The system utilizes a special RF bias that enhances the etching process by increasing ion energy, while also allowing a high selectivity to be achieved. The ashing process utilizes both standard and high-pressure wet-chemical options, including propylene glycol, KOH, and TMAH, to clean substrates of unwanted materials. The cleaning process is highly specialized to reduce the surface contamination of substrates and the work-piece. DRYTEK MS-6 offers superior reliability and performance that allows for precision etching and cleaning of substrates. It is also capable of operation over a wide range of process parameters to provide fine control over etching and cleaning processes. In addition, LAM RESEARCH MS 6 can be used in a variety of combination processes such as an isotropic etch, re-sputtering, and passivation through its multiple chamber setup. Its modular approach offers users flexibility and a wide range of suitable materials for processing. Furthermore, MS-6 offers improved uniformity and repeatability compared to manual wet-chemical processes and can be easily integrated into production systems. By offering the highest performance at a competitive price, LAM RESEARCH MS-6 is one of the best etcher/asher systems available today.
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