Used LAM RESEARCH Dual frequency oxide chamber for Exelan A6 #9232416 for sale
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ID: 9232416
Wafer Size: 8"
8"
Modified process chamber
ESC
Silicon showered
Scroll pump and controller
VME Box with boards
Right angle valve
Scroll pump controller
Computer / Interface board
Upper electrode
Process kit
Frame
Missing parts:
Box
Chamber aluminum pieces
Does not include:
Gas box
RF Set.
LAM RESEARCH Dual frequency oxide chamber for Exelan A6 is an etcher/asher capable of high-precision etching to create patterned and oxide layers on semiconductor materials. This equipment is used in semiconductor fabrication and is designed to reduce charging, improve feature definition, and minimize plasma damage. The Exelan A6 utilizes a dual frequency power supply, capable of supplying up to 10MHz. The chamber operates with an optimized process pressure, creating a homogeneous multi-frequency plasma to develop an oxide layer of approximately 1nm per 5 seconds. The chamber has a precise process window to ensure the best model performance and consistency, and a uniform film. The chamber utilizes two high speed mass flow controllers (MFCs), each having a corrosion resistant stainless steel body and a wide instantaneous flow range to provide accurate and reproducible etch results. It also features a flooded sprinkler equipment with heated water for cooling and looping the part surface for process transparency. The chamber has an integrated Auto-Vent system, enhanced by the built-in gas manifold advancement unit, allowing for an easier and faster substrate removal and vessel filling. The impedance and matching network allow the machine to operate with a wide range of power levels, and offers optimal RF power and waveform to improve ion impact on the substrate. The Exelan A6 is also equipped with a stainless steel thermal wafer boat with generous 30mm depth. The substrate holders of the wafer boat utilize metallic mesh offers superior heat dissipation, allowing for faster thermal cycling and improved temperature uniformity, leading to improved process results. Overall, Dual frequency oxide chamber for Exelan A6 is a highly precise and efficient machine capable of producing accurate patterns and oxide layers on semiconductors. Its impressive technology and features allow for high-precision etching, reduced charging, improved feature definition, and minimized plasma damage.
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