Used LAM RESEARCH EOS #293601477 for sale
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LAM RESEARCH EOS is an etcher and asher designed for use in semiconductor processing. It features a powerful, fully-integrated etch chamber that delivers superior etch rate and uniformity for critical processes such as via etch and front-to-back bends. The equipment can etch multiple layers at the same time and is capable of very high-precision wafer etching. EOS system can be used to etch and asher a wide range of materials, including silicon, germanium, SOI, high-k, copper, aluminum, and tungsten. It utilizes a reliable, single-wafer processing chamber that is able to provide superior etch rate uniformity, with uniformity of +/-1% across the entire wafer. The unit is capable of etching wafers up to 200 mm in diameter and can process up to 200 wafers per hour. To ensure seamless, repeatable processes, LAM RESEARCH EOS offers multiple etch and ashing modes, including single wafer, multi-layer, and multi-etch sequences. This enables enhanced process control and precision through their micro-step adjustment and saturation control functions. Additionally, EOS features a variety of sensors and detectors, including a closed-loop feedback mechanism designed to detect process gases and densities as well as thermal sensors that monitor substrate temperatures to ensure ideal process conditions. LAM RESEARCH EOS is designed for high levels of productivity and quality with capability for accurate, repeatable processes. It benefits from LAM RESEARCH patented high-density plasma (HDP) process technology. With its robust engineering, cost-effective operations, and superior etch rate, EOS is an ideal fit for any high-performance etching and ashing machine.
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