Used LAM RESEARCH EOS #293638918 for sale

LAM RESEARCH EOS is an etcher/asher that specializes in deep reactive ion etching (DRIE) and silicon etching. This advanced equipment is designed with the latest technology to ensure precision and repeatability of its dry etch processes. It offers a wide range of etching options with a modular design, allowing for customization of the system for optimal process performance and scalability for process development. EOS is comprised of a variable frequency RF source that operates up to 13MHz, independent delivery channels with variable flow rate capabilities, and a multi-bias controller for variable bias voltage and treatment duration. It delivers consistent high-quality etching results for various applications including MEMS, CMOS, and silicon-on-insulator (SOI). LAM RESEARCH EOS is configured in a traditional reverse-flow, reflective-etching configuration, featuring an advanced cage design with a planar backwall that offers fast, effective etches. EOS also features a patented, self-aligning mount and substrate adjuster to position substrates in the optimal plane within the etch chamber. This ensures that each substrate and layer receives uniform treatment, and eliminates manual intervention. Furthermore, the system is outfitted with a built-in RF cavity that eliminates standing wave problems and decreases variability in the etch process. LAM RESEARCH EOS's advanced process control and monitoring capabilities provide users with total process control and automation to ensure repeatable results. The controller enables users to program and monitor each etch chamber recipe separately, while the adaptive RF tuning feature offers uniform RF power distribution to assure optimal etching performance. Constant and pulse mode etching can be programmed, as well as multiple chamber operations. Overall, EOS etcher / asher is a high-precision, digitally controlled etcher equipped with advanced technology to ensure repeatable results for many etch applications. Utilizing variable frequency RF sources and multi-bias controllers, LAM RESEARCH EOS offers users total process automation, allowing for customized process development. With its advanced features including self-aligning mounts and substrates adjusters, controlled RF distribution, and its ability to execute multiple chamber operations, EOS is an ideal solution for highly accurate etching processes.