Used LAM RESEARCH EOS #293640560 for sale

LAM RESEARCH EOS is a reactive ion etcher/asher equipment designed for advanced process technologies. It is capable of a wide range of etching applications, from MEMS deep trenches to photoresist etches. The system boasts an advanced Sub-Atomic etch (SAE) capability with the ability to provide ultra-high aspect ratios. It also features a high throughput lattice etch approach which makes it ideal for high volume production runs. EOS unit is based on a robust nanosecond pulsed plasma technology, featuring an integrated bias power source, electrostatic chuck and a vacuum machine. It is capable of providing etch rates up to 1000 times faster than conventional processes, while maintaining a high level of precision and accuracy. It has a low etch damage profile, allowing for high aspect ratios and thick films to be etched. It also has a high throughput capability, allowing for multiple etching processes to be completed in a single run. LAM RESEARCH EOS tool includes an advanced resistive coupled plasma (RCP) source which provides high energy ions to deliver efficient etching of materials of different composition. Its multi-powered source asset has the ability to vary ion energy to meet the need for deeper etching, allowing for process optimization. EOS is also equipped with a low temperature plasma source, enabling reactive processes such as poly etch and reflow to be performed. In addition, LAM RESEARCH EOS model is equipped with a wide range of process monitoring and control features. Its process control equipment enables users to customize the etching process parameters in order to ensure high quality results. The system also features a process monitoring unit with real-time etch rate feedback. This ensures that processes are carried out to the best possible result and that any process variations are minimized. EOS etcher/asher is a powerful tool for performing advanced and reliable etching processes. With its wide range of process control features and its high throughput capability, it is an ideal choice for many production needs. By providing high quality and reliable results, it allows for cost-effective fabrication of high aspect ratio structures and large surface areas for high performance devices.