Used LAM RESEARCH EOS #293666965 for sale

LAM RESEARCH EOS
Manufacturer
LAM RESEARCH
Model
EOS
ID: 293666965
Etcher.
LAM RESEARCH EOS is a widely used etcher/asher for semiconductor processing. This advanced etching technology is employed to increase the precision of the etching process and enable precise etching of small components. It is typically used for patterned wafer etching, allowing high accuracy and smooth etching with short cycle times. EOS etcher consists of an easy to use equipment with automatic susceptors monitoring and wafer alignment, and a single chamber etching system. The main process chamber provides a highly uniform and efficient high-density plasma etching environment working within a wide range of temperatures. LAM RESEARCH EOS unit enables very precise etching control by providing process optimization tools. It provides an automated tuning machine that can quickly and accurately adjust the etching gas delivery, pressure, temperature, etch rate, and other parameters to optimize etch quality. EOS has a built-in dual source capability which allows two different etching chemistries to be used simultaneously which increases the productivity of the etching process. This tool is designed to minimize the risk of wafer damage or contamination, and is able to manage complex etching tasks efficiently and consistently. In addition, LAM RESEARCH EOS is also capable of rapid cycle times. It is designed to minimize any time-consuming rinsing steps and the asset is capable of completing some wet-etching cycles in less than 1 minute. EOS model is also capable of providing very finely controlled etching with precise exposure times. This ensures a high quality etch even when etching very small features. LAM RESEARCH EOS's advanced capabilities makes it ideal for a wide range of etching operations. It is capable of providing high-precision etching of both large and small features without sacrificing accuracy. The equipment is very reliable and is optimized for production, making it an ideal equipment choice for many etching applications. EOS is designed to quickly produce high-quality etchings with fast cycle times, making it a cost-effective solution that helps save time and money.
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