Used LAM RESEARCH EOS #293666968 for sale

LAM RESEARCH EOS is an etcher / asher designed to provide high precision with low-energy consumption, making it the ideal choice for both low-volume and high-volume processes. This state-of-the-art machine combines high-performance etching and ashing technologies into a single, compact platform to support a variety of processes, from basic etching and ashing to advanced and intricate 3D patterns. EOS utilizes Atomic Layer Etch (ALE) Process Dry Etch (PDE) and Plasma-Based Reactive Ion Etch (RIE) technologies to achieve high-resolution etching with outstanding repeatability and superior accuracy across a range of process windows. The Ale process is used to etch low-temperature materials such as flat-panel displays and semiconductors, while the PDE technology is used for etching and removing thermally-sensitive materials. The RIE process is used to create ultra-fine features such as contact holes in the semiconductor industry. LAM RESEARCH EOS is designed for efficient, precise processing of a variety of materials including metal, silicon, ceramics, glass, and polymers. Its modular construction allows for easy transfer of wafers and substrates between locations during sample processing. In addition, the system is fully programmable, allowing for automation of many processes for maximum productivity. EOS features industry-leading technologies to ensure consistent, high-quality etching process results with minimal energy consumption. Its proven dual-zone heating control system uses forced convection to evenly heat up the etch zone with an electro-mechanical shutter and insulated walls, allowing for precise temperature control and uniform heating. Additionally, the included Resonant-DC power supply offers exceptionally precise power delivery with low-voltages, allowing for even etching of delicate features with minimal voltage changes. Overall, LAM RESEARCH EOS provides a flexible, efficient, and cost-effective solution for etching and ashing with extraordinary precision and accuracy. It is the perfect choice for any research or commercial etching project and offers unparalleled performance at an affordable price.