Used LAM RESEARCH Exelan #9235217 for sale

LAM RESEARCH Exelan is a precision etch/ash equipment designed to tackle complex etching requirements with high throughput and quality. It offers three different plasma sources to enable optimal etch process performance over a wide range of substrates including low-k, ultra-low-k (ULK) oxides and nitrides. Exelan system consists of a loadlock chamber, a vacuum chamber, and a robotic substrate transfer unit with up to three plasma sources. LAM RESEARCH Exelan is engineered for maximum throughput and flexibility, allowing for substrate exchange in each chamber and short cycle times. Its three plasma sources offer cost-effective and flexible etching solutions, from Controlled Collapse Low Pressure (CCLP) etching to Atmospheric Pressure Chemical Vapor Deposition (APCVD) and Atomic Layer Deposition (ALD). Exelan's CCLP etch source utilizes advanced microwave generator and antenna technology to ensure a high-performance etching process with reliable results. The machine's torch plasma and downstream plasma sources allow for superior selectivity and high etch rates with low ion energies for sensitive materials such as LHDP and ALD oxides. The plasma sources are designed for easy maintenance and exceptional levels of reliability in challenging production environments with long uptimes. LAM RESEARCH Exelan tool is designed with a powerful software platform that offers advanced process control capabilities, including optimized recipes for different substrate types. These advanced controls facilitate high etch accuracy, repeatability, and maximum throughput in applications where high-quality results are necessary. With its robust design and intuitive software interface, Exelan enables a streamlined etching process. Furthermore, LAM RESEARCH Exelan is a cost-effective and adaptable solution that effectively meets the demands of the semiconductor industry. With its innovative plasma sources, advanced process control features, and sophisticated software, Exelan is a reliable and powerful etch/ash asset.