Used LAM RESEARCH Extrima 300NX #9246538 for sale

LAM RESEARCH Extrima 300NX is an advanced plasma etcher / asher ideal for a range of tasks in industrial and research settings. It features a base pressure of 6×10-7 torr range and an adjustable forward pressure up to 0.1 torr, allowing for extremely precise control of the etching process. The integrated software interface allows for real time parametric recipes and on-the-fly tuning of etching properties. With a patented proprietary design, a Triode RF source, and a power range from 0 to 200 Watts, the equipment can deliver high-quality results at a low cost with easy operation. It has a high capacity 4" quartz tube with 40mm wide bellows designed to eliminate contaminants, and is capable of etching in either batch or single wafer mode. The 300NX has a fast process cycling time, with a programmable turntable, allowing for the optimization of the etching process for specific requirements. The Substrate holder allows for accurate positioning and handling of the substrates which can be easily changed for different etching processes. The system is equipped with a range of safety features designed for worry-free operation. It can be mounted onto a left-right loader for easy loading and unloading of the substrates, and is designed to keep process gases within the unit for a safe and clean environment. The etcher / asher also includes a gas flow monitor and alarm, as well as an inert gas purge machine and filter that help protect the surrounding environment from any toxic or hazardous particles. With these advanced features, Extrima 300NX is designed to meet the most demanding needs of etching operations for a wide range of materials.