Used LAM RESEARCH Extrima 3100 #9270994 for sale

LAM RESEARCH Extrima 3100 is a state-of-the-art etcher/asher equipment designed for semiconductor fabrication. The system uses a vacuum-based process to etch patterns or features into a substrate material. The etching process utilizes plasma, reactive ions, and volatile gases to create patterns of varying geometries, sizes, and depths. Extrima 3100 unit is often referred to as a dielectric etcher and is optimized for processes such as hard mask (HM) Plasma Enhanced Chemical Vapor Deposition (PECVD), dry etching, and deep reactive ion etching (DRIE). The machine is powered by a multi-source DC power supply, delivering a maximum power of 25kW. It is designed to deliver high throughput, excellent uniformity, tight process control, and fast process run times. LAM RESEARCH Extrima 3100 comes equipped with a number of features and capabilities that make it an attractive option for semiconductor manufacturing. It offers an array of process control functions that allow users to accurately and easily program and adjust process parameters such as RF power, RF frequency, gas pressure, timing, and process pressures. The tool is also capable of performing sophisticated process analysis, such as the collection of data points to provide detailed process results. Additionally, the asset can generate comprehensive wafer maps and process history reports. Extrima 3100 employs an innovative safety model, designed to protect users from potential hazards. Its safety equipment includes pressure relief doors, safety interlocks, temperature, flow, and gas monitors, and an emergency stop button. This system can also be configured with non-evaporable getter (NEG) pump isolation valves to further limit potential hazards. Overall, LAM RESEARCH Extrima 3100 is a powerful and reliable etcher/asher unit. Its features and capabilities make it a perfect solution for semiconductor fabrication. Its precision, safety, and ease of use make it an undeniably attractive option for any fabrication process.