Used LAM RESEARCH Flex 45 #9260520 for sale

LAM RESEARCH Flex 45
ID: 9260520
System.
LAM RESEARCH Flex 45 is a high-precision etcher/asher that is ideal for precision wafer processing. It is developed specifically for improved productivity and versatility. The tool provides a continuously moving process resulting in high throughput and short cycle times. Flex 45 delivers superior results at high throughput rates with a combination of both etch and ash processes in a single tool. LAM RESEARCH Flex 45 features a single-chamber process that enables both etch and ash processes to take place at the same time. The combination of etch and ash processes in the same chamber enables higher-quality products that require fewer steps to manufacture. This high-precision etch and ash process is designed to maximize throughput, minimize cycle times and minimize maintenance. Flex 45 is designed to allow for multiple wafers to be processed in parallel, without the need for transferring wafers from one station to another. The design of LAM RESEARCH Flex 45 includes two quartz platen systems that move in opposite directions. This two-platen equipment helps to improve repeatability by minimizing wafer deformation and misalignment. The platen system also helps to minimize particle generation. Flex 45 etcher/asher is equipped with advanced process control and monitoring software. This software consists of an on-board, real-time data collection unit that allows automated or manual parameter adjustment to optimize process conditions. The software also includes an on-board species monitoring machine to help evaluate how different Etch and Ash processes are affected by different process conditions. LAM RESEARCH Flex 45 is designed to safely handle high thermal loads, such as deep wafer etching. It also supports a wide range of materials, including different types of ceramics, aluminum, and titanium. It is also capable of handling surfaces with deposits on them, such as metals, dielectrics and electroluminescent materials. Flex 45 is able to provide repeatable, uniform etching/ashing processes with a fast throughput. It also has a robust tool design to minimize maintenance and increase productivity.
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