Used LAM RESEARCH Flex 45 #9315042 for sale

LAM RESEARCH Flex 45 is an etching and ashing equipment designed for semiconductor device fabrication. This system utilizes pulsed inductive coupled remote plasma processes to achieve a sustained, repeatable etching and low-damage ashing. As the name suggests, it features 45° angled process chambers which allow for a more uniform plasma, better edge profile control, improved hole lateral definition, and uniform surface cleaning. Additionally, Flex 45 has a variable output frequency power supply for precise process tuning, making it ideal for critical layer etching. The unit also features several advanced monitoring capabilities, such as real-time etch rate sensors, in-situ optical ignition and an in-situ monitoring machine. This state-of-the-art tool allows for precise and repeatable etching, making it a great tool for complex structures and extremely tight tolerances. LAM RESEARCH Flex 45 features advanced process controls to ensure consistency between devices and processes. It is equipped with a variety of automated process tools including variable pulse duration, wave shape control options, and pressure and temperature control. This is combined with two-stage cooling capabilities for a wide range of etch and ashing parameters. Furthermore, Flex 45 also provides prime zonal and global uniformity measurement and correction capability, as well as advanced error compensation for different process conditions and cycles. This ensures high-quality results that can be reproduced time and again, making it ideal for high-volume production runs. Overall, LAM RESEARCH Flex 45 is an advanced, precise etching and ashing asset perfect for semiconductor device fabrication. Its angled process chambers enable uniform plasma densities, excellent edge profile control, and uniform surface cleaning. With variable output frequency powers and advanced process controls, this model is suited for critical layer etching and for achieving repeatable, high-quality results.