Used LAM RESEARCH Flex 45 #9351376 for sale

LAM RESEARCH Flex 45 is a flexible and scalable etcher / asher equipment designed to meet a wide variety of plasma cleaning, etching, and ashing requirements. The system is capable of performing various processes in a single run such as sputter etch, plasma etch, oxidative clean, and deep dry etching. It comes with an intuitive user interface that enables easy operation and convenient setup of recipes for various applications. Its advanced capabilities help minimize waste and maximize process repeatability. The unit features a modular design that allows users to configure multiple process chambers providing flexible and reliable solutions for a variety of etching needs. It is equipped with high-performance process source that enables simultaneous operation of up to eight plasma chambers with two power supplies. The chambers are individually equipped with the necessary hardware, video monitors, infrared pyrometers for temperature control, and RF power supplies for independent process control. The machine provides efficient coordination of sequential and simultaneous plasma processes with both manual and programmable plasma recipes. Flex 45 comes with an advanced process control tool that enables high quality processes with real-time feedback and tuning of process parameters. Its ready-to-use thin film deposition module simplifies the deposition process and enables precise control over thickness, compositional, and stress control. Its advanced integration of software enables efficient control and management of recipe data, process optimization, and cleaning sequences. The asset is equipped with superior vacuum controls and pumping systems, ensuring accurate and repeatable processes in a wide range of etch applications. It also features an auto-diving nozzle for precise wafer placement, high velocity shower head with a wide process window, and an onboard recycling model to minimize n-type and p-type contamination. LAM RESEARCH Flex 45 is capable of handling a wide variety of substrates including, but not limited to, silicon, quartz, gallium arsenide, and germanium. Overall, Flex 45 is an ideal solution for flexible and reliable processing of different substrates. With its advanced process capability, control systems, and advanced environmental control systems, it can easily meet the needs of various etching and cleaning applications.