Used LAM RESEARCH FLEX DS #293642654 for sale

LAM RESEARCH FLEX DS is a versatile and reliable etcher/asher designed to meet the needs of semiconductor fabrication. It utilizes a Dual Source technology to optimize the etch profile and uniformity of deposition across the substrate. This technology utilizes two separate sources for both ion bombardment and ion flow to ensure uniformity and high performance. FLEX DS also features an independent Chuck-to-Wafer-Distance (CWD) equipment allowing for dynamic control over the process temperature and pressure during the etching process. This eliminates the need for manual adjustments and ensures accurate etching results. The pressure is adjustable between 0.5 bar and 10 bar, and the temperature is adjustable between 25C and 600C. The system utilizes a chemical delivery unit to precisely control the concentration of the inductively coupled plasma (ICP) etch or asher chemistry. This precision allows for an optimized etch result without the use of masking layers. LAM RESEARCH FLEX DS is equipped with advanced diagnostic tools allowing for high accuracy in control and optimization of etch or asher results. These tools provide a comprehensive report of the real-time process, enabling the optimisation of the process. Its advanced cooling machine enables high etch rates in long processing times. The tool is designed for easy maintenance with a fully enclosed base unit. This allows for quick access to all major asset components, maximizing model uptime and efficiency. FLEX DS etcher/asher is ideal for semiconductor-based material processing. It's reliable and cost effective solution for etching or ashing processes that require high precision and accuracy. Its user-friendly design, high-efficiency components, and advanced diagnostic tools make it the ideal tool for the most challenging processes.