Used LAM RESEARCH FLEX DS #9311091 for sale

LAM RESEARCH FLEX DS is an advanced etcher / asher specifically designed to provide high throughput and precise etching across a variety of semiconductor materials. FLEX DS supports advanced etching processes such as vapor etch, dry etch, oxide etch, and oxide ashing. To optimize process performance, LAM RESEARCH FLEX DS is engineered with a precise Etch Proximity Sensor module which constantly checks the quality of the etched surfaces. The system is capable of handling up to 600 mm wafers, while the process chamber is constructed from stainless steel, enhancing its thermal isolation capabilities and allowing efficient and accurate temperature control. All critical processes are monitored in real-time by the Chamber Pressure Controller and the process control algorithms embedded in the system. To ensure a consistent and repeatable process, each FLEX DS is equipped with Gas Ratio Control, a feature that maintains the gas/vapor composition of the etch shaft. LAM RESEARCH FLEX DS features a high-tech showerhead designed to optimize the rejection rate of materials being etched, while its advanced kinetic plasma technology provides superior etching resolution and performance. The new Fuzzi-Free technology improves the uniformity of etching by eliminating fuzzy edges and eliminating incident angle variations during the etching process. To ensure consistent results, FLEX DS is equipped with a patented impulse gas pre-treatment feature that guarantees superior etching performance. For safety and homogeneity, LAM RESEARCH FLEX DS is also equipped with a unique plasma ignition device that can be adjusted to set different levels of energy required by the plasma. Additionally, FLEX DS is provided with a smart SIF Retaining lid that ensures the integrity of the plasma before and after each etch cycle. The lid also functions as a safety shield and has been tested to withstand up to 210 torque cycles per minute. LAM RESEARCH FLEX DS is an ideal etcher / asher solution for all types of submicron and low-k dielectric etching. With its advanced technology, FLEX DS provides optimal performance and excellent etch yields.