Used LAM RESEARCH Flex FS #9284287 for sale

LAM RESEARCH Flex FS Asher (Etcher) is an advanced, flexible etching and cleaning equipment designed to efficiently remove etch and clean photoresist, general resist, polymer and other thin film deposits. The new system is designed to meet significantly lower delivery times and process repeatability with superior problems and feature assurance. The patented design minimizes debris and process performance that can be improved and maintained over time, delivering the highest levels of throughput and tool utilization. Flex FS Asher offering specifies a dual-drive motor design providing superior uniformity and process consistency. The unit comes integrated with a proprietary high-resolution, high-density imaging machine that allows for advanced in-situ real-time profile monitoring. Other features include advanced high current level control, high-efficiency magnetic compressors, on-board controls for deposition, etching, and high-rate deposition and cleaning, auto-sampling and other options. The well-defined modular architecture of LAM RESEARCH Flex FS provides customers with greater flexibility in terms strategies, with the capability to upgrade to expanded chemistries and processes when needed. The tool offers which can be customized for leading-edge designs. The unique asset architect of Flex FS Asher allows for highly efficient, reliable, and repeatable processes for the highest levels of throughput and reliability. Its flexibility also helps reduce manufacturing costs, as LAM RESEARCH model can perform many complex etching recipes with fewer steps. The built-in monitoring allows you to quickly analyze the uniformity of processes, compare results, and identify potential problems early in the manufacturing process. By optimizing pulse design, LAM RESEARCH Flex FS Asher minimizes damage to substrates, minimizes the impact of static charging, reduces process variation and improves cleaning with recipe-driven high-voltage pulsed plasma. The equipment is designed to remove patterned photoresists, polymers, and other films, including ones with feature sizes down to 180nm without introducing forward and reverse bias. Flex FS plasma system eliminates the need for harsh chemical baths or high-pressure flushing, saving time and resources. LAM RESEARCH Flex FS is an advanced etching unit designed to meet the most stringent requirements for fast and cost-effective processing of advanced devices. By streamlining the etching process, speeding up time-to-market, and delivering a high level of uniformity, the FS Asher machine optimizes device production for optimal yield and time-to-market.