Used LAM RESEARCH FLEX FX EFEM #9270663 for sale

LAM RESEARCH FLEX FX EFEM is a high performance, large area etcher/asher designed to enable precise and reliable processing. It features a multi-axis, closed loop motion equipment with fast, low inertia stages, allowing for high throughput processing and flexible operation with repeatable results. The system's unique design enables a large range of targets and shorter cycle times. FLEX FX EFEM comes with a multi-zone gas panel and two chamber isolation Gate valves to enable fast and accurate etch and ashing steps. Plasma sources equipped with low pressure radio frequency (LP-RF) generators generate magnetic fields that interact with gas species, producing a plasma. This plasma is then used to remove or modify organic and inorganic materials from the surface of the target substrate. The unit also comes with a high-resolution in-situ monitor that can measure the material change across the different etch and ashing zones. This monitor is based on on-wafer spectroscopy, and enables real-time feedback on the progress of the process. Additionally, a forward viewing optical camera machine checks on the status of the substrate to ensure precise transfer and alignment of the substrate on the target. The process chamber includes a comprehensive range of recipes for both etching and ashing, and a superior uniformity control tool. LAM RESEARCH FLEX FX EFEM also offers variable Chamber and Stage pressure control, as well as an advanced temperature control asset for both the Etch and Ashers Chambers, providing optimum conditions for a variety of materials. With its fast, precise, and repeatable operation, FLEX FX EFEM is a powerful tool for reducing costs and shortening manufacturing timelines. Its closed-loop motion control model and comprehensive recipe library ensure that processes can be optimised and carefully monitored, increasing yields and reducing errors. With a highly configurable design and advanced control capabilities, LAM RESEARCH FLEX FX EFEM is the perfect tool for etch or ash processing applications.