Used LAM RESEARCH Gamma XPR #9365950 for sale

ID: 9365950
Wafer Size: 12"
Vintage: 2014
Etcher, 12" Does not include RF generator 2014 vintage.
LAM RESEARCH Gamma XPR is an etcher / asher designed for semiconductor processes. This high-performance, cost-effective equipment has a wide range of features and benefits that makes it ideal for semiconductor fabrication processes in the consumer electronics market. The system utilizes a patented LAM-specific etch chemistry to precisely etch into high-aspect ratios, deep trenches and high resolution features with precise sidewall profiles. Gamma XPR achieves accurate step coverage with etches of trench depths as small as 1 micron and sidewall angles of less than 15 degrees. The unit is equipped with a three-axis piezo-motor-driven wafer handling machine that provides both high accuracy and fast throughput. This integrated handling tool enables LAM RESEARCH Gamma XPR to process three 200 mm, or up to six 100 mm wafers, simultaneously. Additionally, its unique movement structure safeguards against potential wafer-to-wafer contamination, achieving highly reliable product yield. Gamma XPR is designed with advanced asset-level features that provide unprecedented process control in ashing, etching, and sputter processes. Its advanced software algorithms and diagnostics enable accurate process monitoring and control, resulting in consistent process performance from one run to the next. The model also uses LAM's EasyPulse DC power capability, which allows it to tailor the DC pulse parameters tilts the etch depth distribution to achieve highly accurate etch profiles. This feature helps reduce the need for additional post-etch process steps, saving time and ultimately money. LAM RESEARCH Gamma XPR etcher / asher is also backed by LAM's comprehensive customer service programs, offering 24/7 technical support and active support programs to keep your equipment running efficiently and reliably. These customer service programs provide assurance that your etcher / asher will run reliably and with peak performance.
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