Used LAM RESEARCH H12IHE #293661561 for sale

LAM RESEARCH H12IHE is a highly advanced, beam-type Plasma Etcher/Asher equipment designed to provide superior results for a variety of thin-film processing and modification applications. Its design incorporates engineering enhancements to provide excellent uniformity and precision for critical etch processes. It features a new generation of advanced high-pressure gas control system that offers a high degree of customization and flexibility. H12IHE is a six chamber unit that consists of three main sections: a source chamber, etch chamber, and N2 chamber. It also includes an Ion Gun with a long-life shield assembly for improved uniformity and repeatability as well as a Coolant Machine for improved thermal management. LAM RESEARCH H12IHE is designed to meet the most demanding high-throughput production requirements while delivering excellent performance over a wide range of etch parameters. The etch source chamber is equipped with a Plasma Source (EEM) to supply the energetic ions needed for the etch process. The high pressure gas control tool features precision pressure controls and atmospheric threshold monitoring to ensure operation in the most controlled, safe, and efficient manner. H12IHE incorporates several different High-Vacuum (HV) pumping technologies that enable custom chamber fill rates and allow for optimal process chamber fill times and excellent uniformity and repeatability. The etch chamber is designed to provide superior uniformity and repeatability of the plasma processes. Its linear-vacuum profile ensures uniform etching across the substrate. The state-of-the-art gas-flow control asset of LAM RESEARCH H12IHE provides precise control and automated management of the physical parameters of the etch process. The N2 chamber provides a dense N2 environment that greatly reduces the etch rate of the material being etched. This chamber also contains a transparent window that displays how the etch process is progressing. H12IHE is equipped with a bonus process module that allows users to add additional process modules to the model allowing operation at higher throughput rates. LAM RESEARCH H12IHE is backed by a comprehensive network of service and support personnel to ensure that customers receive the highest levels of performance and reliability. The equipment is designed to be easily upgradeable and customizable, allowing it to meet the latest thin-film processing needs. It also features an embedded computer system with industrial safety standards responsible for monitoring safety parameters in real-time. Its various design features, such as the precision pressure controls, efficient gas control unit, and linear-vacuum profile enable it to deliver reliable, repeatable, and high-quality results.