Used LAM RESEARCH IGS #9157990 for sale

LAM RESEARCH IGS (Inductively-Coupled Plasma Reactive Ion Etcher/Asher) is an advanced etching equipment designed for applications in the semiconductor industry. It is based on the exclusive LAM Pulsed Plasma Reactive Ion Etching (PPP-RIE) technology, which allows for rapid, high-precision etching processes without the need for additional hazardous materials. IGS etcher/asher features a completely enclosed chamber, and allows the user to take advantage of a wide range of etching processes while achieving precise speed, depth and lateral control. LAM RESEARCH IGS system utilizes a robust power platform to generate an electrodeless inductively-coupled plasma (ICP) reaction chamber. This high-voltage generator features active electromagnetics and adjustable voltage and current levels for precise control of the plasma layer. It generates a low-temperature, high-density plasma layer that allows for etching times faster than those achievable with conventional etching processes. IGS unit includes a number of separate gas sources that are connected to the gas distribution chassis. These gases are then mixed and then fed into the chamber, allowing for multiple etching processes simultaneously. An additional feature of LAM RESEARCH IGS machine is the integrated optimization tool, which allows for real-time process optimization. The optimization asset uses a variety of sensors located in the etch chamber and process hardware, along with specialized software to continually monitor the etching process. This tightly integrated model helps to ensure that the etching and ashing operations are proceeding as expected, and allows the user to make corrective adjustments on demand. The multi-functional IGS etcher/asher is well suited for a wide range of applications, such as MEMS, MEMS sensors, nanotechnology, micro-fabrication, biomedical devices, opto-electronics, micro-electromechanical systems (MEMS), micro-circuits and other specialty applications. With its advanced features and capabilities, it is the premier etching equipment for the semiconductor industry.