Used LAM RESEARCH INOVA NEXT #9138133 for sale

LAM RESEARCH INOVA NEXT is a state-of-the-art etching and ashing equipment designed for critical applications requiring high productivity, optimal process control, and the highest quality precision results. INOVA NEXT is perfect for semiconductor manufacturers who require more advanced production capabilities than ever before. LAM RESEARCH INOVA NEXT is a fully automated and integrated etching and ashing system with powerful features such as process automation, precision metrology capabilities, and foresight into window cleaning and substrate treatments. INOVA NEXT delivers increased throughput, including low cycle times, simultaneous loading and unloading, and rapid chamber transitions — up to 20 percent faster than previous models. The innovative design of its process chamber reduces particle generation and mitigates the risk of particle contamination. Its smart protection unit helps maintain optimal cleanliness by measuring key parameters and adjusting processes in real-time. LAM RESEARCH INOVA NEXT also comes with high-quality process control, offering complete solution for etching processes. It has a dedicated process preview capability that allows for simulated dry etch processes with full substrate characterization. This results in improved fab yield and process optimization, plus greater flexibility for development and downstream yield improvement. In addition, its numerous connection options enable maximum integration and flexibility in scaling from limited to maximum clusters. This innovative machine seamlessly supports GaAs, III-V, silicon, and other technologies. INOVA NEXT also supports turbine operation, which unlocks access to the full range of etch processes available on the epi/metal tool. This tool is an ideal choice for users who are looking for the most accurate and efficient metal etching process. Lastly, LAM RESEARCH INOVA NEXT offers industry-leading reliability and conformal deposition, enabling optimal process endpoints and lower turn-around times. The unique and robust design of its components reduces downtime, while its advanced metrology capabilities ensure the highest precision results. So overall, INOVA NEXT is the perfect choice for etching and ashing applications that require reliable performance and the highest precision outcomes. With its advanced automation and control capabilities, high-quality process control and integration, and 3D conformal deposition capabilities it is an ideal choice for many different types of semiconductor applications.