Used LAM RESEARCH Inova #293610307 for sale

LAM RESEARCH Inova is an advanced etcher / asher, developed by LAM RESEARCH Corporation. This state-of-the-art etcher / asher is designed to deliver high throughput, precision and reliability. Inova's advanced capabilities include low voltage substrate etching to produce low thermal budget etch profiles, high density plasma (HDP) etch to achieve superior etch selectivity, and total wafer surface coverage etch to ensure precision surface modification. LAM RESEARCH Inova is designed with flexibility in mind, allowing for a wide range of etch parameters to be set for various applications. This includes the ability to adjust gas mix ratios, and adjust the pressure, power and temperature in order to achieve the desired etch performance. In addition, Inova's advanced software control packages allow the user to customize and optimize the etch process, as well as to monitor and analyze the etch results in real time. LAM RESEARCH Inova supports both batch and single wafer processing, and is capable of 330mm wafer processing. The etch chamber is cooled using liquid nitrogen to ensure uniform etch process and providing superior cooling for uniform profiles. It also features a pressure-controlled etch chamber with an automatic pressure control system, designed to maintain a stable etch environment. In addition, Inova is equipped with an advanced remote diagnostic system, providing enhanced remote support. LAM RESEARCH Inova provides excellent performance in etching applications such as oxide stripping, photoresist etching and hard mask etching. Additionally, it is designed to etch a wide variety of materials, as well as to accommodate different film stacks. This makes Inova an ideal choice for a wide variety of etch applications in the semiconductor, MEMS and MEMC industries. In summary, LAM RESEARCH Inova is an advanced etch / asher, engineered for fast, precise and reliable etch performance. This sophisticated etch tool is fully enclosed, provides a controlled etch environment, and is equipped with an advanced software control package for customized performance. In addition, it supports batch and single wafer processing, and is capable of 330mm wafer processing, making it an excellent choice for etching applications in a variety of industries.