Used LAM RESEARCH Inova #9315044 for sale

LAM RESEARCH Inova etcher / asher is an advanced, multi-configurable etcher / asher equipment used for planarizing and etching a wide variety of substrates such as silicon, glass, and metal films. The system is equipped with state-of-the-art automation, computer control of all essential parameters, and user-friendly features to ensure efficient, independent operation. Inova is designed to perform processes such as ion beam sputtering (IBS), reactive ion etching (RIE), deep silicon etching (DSE), thermal processing (TP), and other etching operations. With its multi-functional chamber, the unit can also deliver a variety of etching profiles, if needed, as well as result in excellent wafer-to-wafer uniformity and precision. Additionally, the machine is designed to allow multiple substrate configurations for precise and rapid etching, thereby providing highly consistent results regardless of the particular configuration required. LAM RESEARCH Inova's state-of-the-art software allows the user to control each process individually, improving critical parameter stability. The tool also offers advanced temperature-controlled chambers, precise optical control, and an integrated support and maintenance asset to ensure optimal performance. Inova's chambers are designed and vacuum sealed for optimal process repeatability and stability. The etcher / asher also includes real-time visualization and data acquisition capabilities, enabling users to make better process and equipment decisions. Its integrated optical endpointing model allows the user to monitor the depth, angles, and critical dimensions for accurate endpointing. LAM RESEARCH Inova's programmable panel display, which has an intuitive user interface, increases user's control and flexibility over etching processes, providing quick setup, video imaging analyses, and advanced data management and security features. The equipment also has an integrated multi-tool capability, allowing the user to select the best etch rate, power, temperature, and cooling based on individual process conditions and substrate configurations. Inova's safety features include 24/7 tracking of process activities, real-time safety alarm monitoring, and electrostatic discharge protection, to ensure personnel safety during operation. In conclusion, LAM RESEARCH Inova etcher / asher offers an advanced, multi-configurable system for etching and planarizing a wide variety of substrates. It offers process control, repeatability, safety features, and real-time visualization and data acquisition capabilities, enabling the user to achieve optimal performance, precision, and consistency.