Used LAM RESEARCH Isotropic chambers for 4520i #9352909 for sale

LAM RESEARCH 4520i Isotropic Chambers are designed for a variety of etching and ashing applications. This equipment offers unparalleled reliability, flexibility, and performance in organic and oxide ashing and etching processes. With its advanced control systems, the 4520i provides consistent process repeatability, excellent uniformity, and extremely efficient etch uniformities compared to legacy systems. As a comprehensive etching system, the chamber also offers excellent sidewall feature, as well as superior throughput. The 4520i chamber is constructed with semi-automated configuration that brings all the most essential features to users. The chamber is approximately twice the size of a standard 200mm wet bench and is provided with a full suite of innovative features, including programmable frequency pumping and universal slide mounts. Additionally, the process chamber design utilizes a sealed Eurojet vacuum unit to provide up to 5 microns of base pressure required for some etch processes. The advanced control systems of the 4520i enable precise control over the entire process. The user interfaces are designed for intuitive operation to facilitate easy setup and parameter modifications. The machine is also equipped with an integrated recipe library including over 130 recipes; all of which can be modified to suit the specific process parameters. Moreover, the 4520i enables users to monitor parameters in real-time during the etching or ashing process to ensure process stability and process uniformity. The 4520i is designed to maximize throughput with its advanced chamber design. The etching or ashing process requires a low process load, allowing more space for wafers at the edge of the chamber. The chamber also offers enhanced wafer-to-wafer uniformity and greater throughput due to its open design. Due to its embedded features, the tool can be configured for process times of up to 15 minutes and as low as 3 minutes. This makes it suitable for a wide range of applications including low-cost test runs and production batches. The semi-automated design of the 4520i Isotropic Chambers make it an excellent choice for etching or ashing processes that require reliable, repeatable, and precise process performance. Due to its advanced control systems, it provides consistent uniformity in etch rates and exceptional throughput. Additionally, this asset offers great flexibility and can be easily customized to suit specific process requirements.