Used LAM RESEARCH Kiyo EX #293630220 for sale

LAM RESEARCH Kiyo EX
ID: 293630220
Vintage: 2011
System 2011 vintage.
LAM RESEARCH Kiyo EX is an advanced etcher / asher tool designed to provide high throughput, low maintenance, and cost effective materials processing. Its unique dual chamber architecture allows the tool to provide a low-cost-per-batch etch and asher process. The dual chamber architecture allows for independent gas processing enabling simultaneous etch and asher functions or independent wafer handling. The powerful source-level pulsing electronics and process control software enable precise control of etch and asher parameters with tight process margins. Kiyo EX offers high throughput, uniformity, and repeatability that is second to none. Its high output rate of 3-4 wafers/min and processable wafer size up to 300 mm are unmatched in the industry. The dual chamber architecture allows for teaming up with other tools either upstream or downstream for wafer handling and or very complex processes. The source-level pulsing electronics enable precision process control, with recipe traceability and accurate process simulations. The controller is powered by Windows CE operating equipment, with a dedicated graphical interface which allows a wide variety of parameters to be controlled, setting recipe parameters, including gas type, chamber pressure, wafer speed, wafer temperature and other process variables. LAM RESEARCH Kiyo EX also features advanced safety and environmental protection features such as an active purge system to ensure high process safety. Its advanced monitoring and control systems feature a self-diagnostic unit which checks to ensure machine compliance and a built in safety interlock switch for gas handling. The active flushing capability combined with the low-level exhaust flow control tool helps to maintain a safe environment for sensitive processes such as LEF and passivation. Overall Kiyo EX offers excellent capabilities for enabling cost effective high throughput etch and asher processes. Its dual chamber architecture, advanced process control, and safety features make it a top choice for etch and asher applications. With its wide range of applications, it is an ideal tool for virtually any industrial or research materials processing requirement.
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