Used LAM RESEARCH KIYO FX STRIP #9311232 for sale

LAM RESEARCH KIYO FX STRIP is an advanced etch/ash 32-bit equipment providing precision etch/ash processes in a small footprint, thus making it perfect for high-volume production enablement applications. A flexible platform, KIYO FX STRIP is designed to meet the increased demands associated with deep etch and shallow ash application, as well as dielectric etching and BEOL processes. Offering maximum throughput and recipe capability, it can be used for a variety of multi-layer etch and ash scheduling as well as advanced process flows to accommodate the tight tolerances associated with integrated device structures. It is built with a scaleable recipe database, combining the best of LAM's SEMI-ES7 computerized equipment control systems with advanced vacuum system technology and process control capability. LAM RESEARCH KIYO FX STRIP also features an advanced array of process accessories, including automated process end-point detector, automatic zone power control, programmable process time control, and automatic wafer wash capability. The low-voltage power supply ensures precision etching at low voltage, preventing irregularities in the etch process. Furthermore, this unit is compatible with a range of wafer sizes, and it has a modular platform that can be adapted to a variety of applications. KIYO FX STRIP has a powerful process visualizer with user-friendly graphical interface that allows operators to monitor and adjust the process. It also features reporting capabilities that allow operators to analyze and fine-tune the process before the start of each run. Features such as process monitoring, monitoring of hardware components, temperature control, and automatic process control allow fast response to changing process variables and efficient process cycles. Overall, LAM RESEARCH KIYO FX STRIP is an advanced etcher/asher machine which provides precision etch/ash processes in a small footprint. Boasting a range of useful process accessories such as automated process end-point detector, zone power control, and wafer wash, as well as integrated reporting and process visualizing capabilities, it offers deep etch, shallow ash, and dielectric etching and BEOL processes, as well as fast response to changing process variables and reduced setup times, making it an ideal solution for high-volume production enablement applications.