Used LAM RESEARCH KIYO FX #293791061 for sale
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LAM RESEARCH KIYO FX is a powerful etcher / asher solution built on leading-edge etch / ash technology from the Plasma Etch group. KIYO FX is designed to achieve high throughput, clean and uniform results in etching and ash process steps. It is an ideal solution for a wide range of etching and ashing applications, including semiconductor wafer substrate material etching, MEMS/NEMS/MOEMS device etching, nanolithography and photolithography, patterning of masks and other photomask material, and more. LAM RESEARCH KIYO FX features an innovative low-pressure reactive ion etching (RIE) technique that produces high quality surfaces and uniform etch profiles. The equipment uses both active and pulsed mode etching, which can produce patterns and features at the sub-micron scale. KIYO FX also includes a variety of process tools such as microwave plasmas, low-pressure inductively coupled plasmas (ICP), and deep reactive ion etching (DRIE). It is capable of medium- to high-rate etching performance, with a high level of precision in the control of within-batch and inter-batch variability of critical parameters such as feature size and etch uniformity. LAM RESEARCH KIYO FX is designed with a wide variety of process-enhancing features, including automation capabilities, temperature control, application monitoring, and programmable data logging. Our innovative process gases, including chlorine, oxygen and argon, ensure superior etch performance. The system also features a high-resolution vision unit that helps to optimize process quality, as well as a data logging machine that records critical process parameters such as pressure, flow rate, temperature, and other relevant parameters. KIYO FX provides high throughput, low-pressure etching and ash performance suitable for a wide range of materials. Its robust and reliable platform is capable of operating with multiple materials, from dielectric films to metals, and even tough material combinations, making it the ideal etching solution for advanced fabrication and device fabrication.
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